Patents by Inventor Wen-Ta Liang

Wen-Ta Liang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10274818
    Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: April 30, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hua-Tai Lin, Yu-Chuan Yang, Wen-Ta Liang, Ching-Huang Chen, Chi-Yuan Sun, Shih-Che Wang
  • Publication number: 20180174839
    Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
    Type: Application
    Filed: June 9, 2017
    Publication date: June 21, 2018
    Inventors: Hua-Tai Lin, Yu-Chuan Yang, Wen-Ta Liang, Ching-Huang Chen, Chi-Yuan Sun, Shih-Che Wang