Patents by Inventor Wen-Tein Chen

Wen-Tein Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Slurry delivery system for chemical mechanical polisher
    Patent number: 6702655
    Abstract: A slurry delivery system for a chemical mechanical polisher, comprising a bag housing fitted with a slurry intake conduit and a slurry outlet conduit. An expandible and collapsible pump bag is provided in fluid communication with the conduits inside the bag housing, and the interior of the pump bag is sealed from the bag housing. As an air/vacuum controller withdraws air from the housing, the pump bag enlarges and slurry is drawn into the pump bag. As the air/vacuum controller subsequently introduces air into the housing, the pump bag collapses and the slurry is expelled from the pump bag through the slurry outlet conduit. A purge valve is provided upstream of the pump bag to remove air bubbles from the slurry and vent the air to the atmosphere.
    Type: Grant
    Filed: July 5, 2002
    Date of Patent: March 9, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Wei-Train Chen, Wen-Tein Chen
  • SLURRY DELIVERY SYSTEM FOR CHEMICAL MECHANICAL POLISHER
    Publication number: 20040004090
    Abstract: A slurry delivery system for a chemical mechanical polisher, comprising a bag housing fitted with a slurry intake conduit and a slurry outlet conduit. An expandible and collapsible pump bag is provided in fluid communication with the conduits inside the bag housing, and the interior of the pump bag is sealed from the bag housing. As an air/vacuum controller withdraws air from the housing, the pump bag enlarges and slurry is drawn into the pump bag. As the air/vacuum controller subsequently introduces air into the housing, the pump bag collapses and the slurry is expelled from the pump bag through the slurry outlet conduit. A purge valve is provided upstream of the pump bag to remove air bubbles from the slurry and vent the air to the atmosphere.
    Type: Application
    Filed: July 5, 2002
    Publication date: January 8, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Train Chen, Wen-Tein Chen