Patents by Inventor Wen-Tseng Cheng

Wen-Tseng Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR FORMING A POLYSILICON THIN FILM LAYER
    Publication number: 20090127557
    Abstract: This invention provides a method for fabricating a polysilicon thin film layer, which performs a gas plasma treatment on channel regions defined in the polysilicon thin film layer after the polysilicon thin film layer is formed on a substrate. Threshold voltages for polysilicon thin film transistors formed subsequently are thus adjusted by the gas plasma treatment. A gate insulating layer is formed on the polysilicon thin film layer after the gas plasma treatment.
    Type: Application
    Filed: November 11, 2008
    Publication date: May 21, 2009
    Applicant: TPO Displays Corp.
    Inventors: Tsung-Yen LIN, Ho-Hsuan Lin, Wen-Tseng Cheng, Shan-Hung Tsai