Patents by Inventor Wen-Tung Hsu
Wen-Tung Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8766127Abstract: A touch sensor is provided. The touch sensor includes a first buffer layer disposed on a substrate, a first electrode layer disposed on the first buffer layer, a second buffer layer disposed on the first electrode layer and a second electrode layer disposed on the second buffer layer and electrically connected with the first electrode layer, wherein the first and second buffer layers are formed of the same material including an insulated metal oxide, and the first and second electrode layers are formed of the same material including a doped metal oxide.Type: GrantFiled: September 14, 2012Date of Patent: July 1, 2014Assignee: Industrial Technology Research InstituteInventors: Chia-Chiang Chang, Ta-Hsin Chou, Wen-Tung Hsu
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Publication number: 20130277195Abstract: A touch sensor is provided. The touch sensor includes a first buffer layer disposed on a substrate, a first electrode layer disposed on the first buffer layer, a second buffer layer disposed on the first electrode layer and a second electrode layer disposed on the second buffer layer and electrically connected with the first electrode layer, wherein the first and second buffer layers are formed of the same material including an insulated metal oxide, and the first and second electrode layers are formed of the same material including a doped metal oxide.Type: ApplicationFiled: September 14, 2012Publication date: October 24, 2013Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: CHIA-CHIANG CHANG, Ta-Hsin Chou, Wen-Tung Hsu
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Patent number: 8381678Abstract: A wide area atmospheric pressure plasma jet apparatus including a transmission mechanism, a plasma housing and two plasma-generating devices is provided. The transmission mechanism includes a rotation output end that has a center axis. The plasma housing has an opening. The plasma housing further has a air-attracting hole near the rotation output end and extended from an outer wall of the plasma housing to the interior of the plasma housing, so that the heat of the plasma housing can be dissipated due to the generated gas circulation. The plasma-generating devices are disposed within the plasma housing and connected with the rotation output end. Each of the plasma-generating devices has a plasma nozzle located at the opening and tilts from the center axis. When the rotation output end drives the plasma-generating devices to rotate, two plasma beams are obliquely ejected from the plasma nozzle and the plasma processing area is increased.Type: GrantFiled: July 13, 2009Date of Patent: February 26, 2013Assignee: Industrial Technology Research InstituteInventors: Chen-Der Tsai, Wen-Tung Hsu, Chin-Jyi Wu, Chih-Wei Chen
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Patent number: 8316796Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.Type: GrantFiled: December 12, 2007Date of Patent: November 27, 2012Assignee: Industrial Technology Research InstituteInventors: Chi-Hung Liu, Chih-Ming Chen, Chun-Hsien Su, Chih-Wei Chen, Wen-Tung Hsu, Chun-Hung Lin
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Patent number: 8277616Abstract: A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.Type: GrantFiled: August 28, 2007Date of Patent: October 2, 2012Assignee: Industrial Technology Research InstituteInventors: Chi-Hung Liu, Chun-Hung Lin, Chun-Hsien Su, Wen-Tung Hsu
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Patent number: 8212174Abstract: A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.Type: GrantFiled: August 7, 2009Date of Patent: July 3, 2012Assignee: Industrial Technology Research InstituteInventors: Chen-Der Tsai, Wen-Tung Hsu, Chin-Jyi Wu, Chih-Wei Chen
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Publication number: 20120145078Abstract: A showerhead integrating intake and exhaust is provided for showering a gas. The showerhead at least includes a showerhead body that has a gas-active surface and a plurality of intake bores thereon. The showerhead body further includes a central exhaust vent disposed on the gas-active surface. The central exhaust vent may exhaust standing gas and further pre-exhaust byproduct from reaction process.Type: ApplicationFiled: August 17, 2011Publication date: June 14, 2012Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chih-Yung Huang, Ching-Chiun Wang, Chen-Der Tsai, Wen-Tung Hsu, Fu-Ching Tung, Chien-Chih Chen, Yi-Tsung Pan, Chien-Jen Sun
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Patent number: 8158211Abstract: A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.Type: GrantFiled: December 24, 2008Date of Patent: April 17, 2012Assignee: Industrial Technology Research InstituteInventors: Chih-Wei Chen, Chin-Jyi Wu, Wen-Tzong Hsieh, Wen-Tung Hsu, Chun-Hung Lin
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Patent number: 8092750Abstract: A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.Type: GrantFiled: February 19, 2009Date of Patent: January 10, 2012Assignee: Industrial Technology Research InstituteInventors: Chi-Hung Liu, Chen-Der Tsai, Chun-Hsien Su, Wen-Tung Hsu, Jen-Hui Tsai, Chun Huang
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Publication number: 20110100556Abstract: A plasma system with an injection device is provided. The plasma system comprises a plasma cavity and an injection device. The plasma cavity comprises a first electrode and a second for generating plasma. The injection device comprises a plasma injection tube and at least a reactant injection tube. The plasma injection tube is connected to the plasma cavity. The plasma injection tube comprises an inlet, an outlet and an outer sidewall. The plasma injection tube injects the plasma from the inlet and guides the plasma out through the outlet. The outer sidewall has a width decreasing from the inlet to the outlet. The reactant injection tube is disposed outside of the outer sidewall. The reactant injection tube injects a reactant to the outer sidewall so that the reactant flows along the outer sidewall toward the outlet and mixes with the plasma at the outlet.Type: ApplicationFiled: December 24, 2009Publication date: May 5, 2011Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chi-Hung Liu, Chen-Der Tsai, Wen-Tung Hsu, Chun-Hsien Su, Wen-Chin Cheng, Liang-Yi Chen
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Publication number: 20110073563Abstract: A patterning method for a carbon-based substrate is provided. The patterning method for the carbon-based substrate includes the following steps. The carbon-based substrate is provided. An atmospheric pressure plasma is produced from a plasma gas under an open air environment. The plasma gas includes oxygen. The carbon-based substrate is etched by the atmospheric pressure plasma.Type: ApplicationFiled: September 25, 2009Publication date: March 31, 2011Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chia-Chiang Chang, Chin-Jyi Wu, Shu-Jiuan Huang, Wen-Tung Hsu, Chih-Ming Hu, Shin-Liang Kuo
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Publication number: 20100164353Abstract: A wide area atmospheric pressure plasma jet apparatus including a transmission mechanism, a plasma housing and two plasma-generating devices is provided. The transmission mechanism includes a rotation output end that has a center axis. The plasma housing has an opening. The plasma housing further has a air-attracting hole near the rotation output end and extended from an outer wall of the plasma housing to the interior of the plasma housing, so that the heat of the plasma housing can be dissipated due to the generated gas circulation. The plasma-generating devices are disposed within the plasma housing and connected with the rotation output end. Each of the plasma-generating devices has a plasma nozzle located at the opening and tilts from the center axis. When the rotation output end drives the plasma-generating devices to rotate, two plasma beams are obliquely ejected from the plasma nozzle and the plasma processing area is increased.Type: ApplicationFiled: July 13, 2009Publication date: July 1, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chen-Der Tsai, Wen-Tung Hsu, Chin-Jyi Wu, Chih-Wei Chen
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Publication number: 20100147808Abstract: A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.Type: ApplicationFiled: August 7, 2009Publication date: June 17, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chen-Der Tsai, Wen-Tung Hsu, Chin-Jyi Wu, Chih-Wei Chen
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Publication number: 20100098600Abstract: A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.Type: ApplicationFiled: February 19, 2009Publication date: April 22, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chi-Hung Liu, Chen-Der Tsai, Chun-Hsien Su, Wen-Tung Hsu, Jen-Hui Tsai, Chun Huang
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Publication number: 20090169822Abstract: A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.Type: ApplicationFiled: December 24, 2008Publication date: July 2, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chih-Wei Chen, Chin-Jyi Wu, Wen-Tzong Hsieh, Wen-Tung Hsu, Chun-Hung Lin
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Publication number: 20090159212Abstract: A jet plasma gun and a plasma device using the same are provided. The jet plasma gun is for jetting plasma to process a surface of a substrate. The jet plasma gun includes a plasma producer, a plasma nozzle and a barrier. The plasma producer is for providing plasma. The plasma nozzle disposed between the substrate and plasma producer has a first opening and a second opening. The first opening faces plasma producer, and the second opening faces the substrate. The barrier being an insulator is disposed between the plasma nozzle and the substrate and has a through hole corresponding to the second opening. The plasma passes through the plasma nozzle and the through hole to reach the substrate.Type: ApplicationFiled: June 11, 2008Publication date: June 25, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chia-Chiang Chang, Chen-Der Tsai, Wen-Tung Hsu, Chih-Wei Chen, Chin-Jyi Wu
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Publication number: 20090162263Abstract: An atmospheric-pressure plasma reactor comprising a first electrode, a second electrode and a power generation unit. The first electrode and the second electrode respectively have a first opening and a second opening corresponding to each other. Disposed inside the first electrode is a gas-in space, which communicates with the first opening. Moreover, the power generation unit is coupled to the first electrode to provide the first electrode with AC power. The second electrode is grounded. The plasma process by the atmospheric-pressure plasma reactor is capable of forming high-uniformity thin film on a substrate.Type: ApplicationFiled: May 20, 2008Publication date: June 25, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: CHIA-CHIANG CHANG, JIN-CHING WU, CHIH-WEI CHEN, WEN-TUNG HSU
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Publication number: 20090078685Abstract: A plasma head and the plasma-discharging device using the same are disclosed. The plasma-discharging device comprises a power supply with two electrode terminals. The plasma head comprises: an outer electrode having a chamber formed therein; an inner electrode, disposed inside the chamber; and a flow guiding structure, disposed inside the inner electrode; wherein the outer electrode and the inner electrode are connected respectively to the two electrode terminals of the power supply; and the flow guiding structure further comprises at least an inlet for introducing a working fluid into the inner electrode and at least an outlet being communicated with the chamber of the outer electrode to guide the working fluid to flow into the chamber of the outer chamber.Type: ApplicationFiled: April 2, 2008Publication date: March 26, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chen-Der TSAI, Chih-Wei CHEN, Chia-Chiang CHANG, Wen-Tung HSU, Te-Hui YANG
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Publication number: 20090064933Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.Type: ApplicationFiled: December 12, 2007Publication date: March 12, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chi-Hung Liu, Chih-Ming Chen, Chun-Hsien Su, Chih-Wei Chen, Wen-Tung Hsu, Chun-Hung Lin
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Publication number: 20090004620Abstract: A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.Type: ApplicationFiled: August 28, 2007Publication date: January 1, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chi-Hung LIU, Chun-Hung LIN, Chun-Hsien SU, Wen-Tung HSU