Patents by Inventor Wen-Tzong Hsieh

Wen-Tzong Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8158211
    Abstract: A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: April 17, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chih-Wei Chen, Chin-Jyi Wu, Wen-Tzong Hsieh, Wen-Tung Hsu, Chun-Hung Lin
  • Publication number: 20090169822
    Abstract: A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.
    Type: Application
    Filed: December 24, 2008
    Publication date: July 2, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Wei Chen, Chin-Jyi Wu, Wen-Tzong Hsieh, Wen-Tung Hsu, Chun-Hung Lin
  • Publication number: 20080066679
    Abstract: A processing system is used for processing an object by a first fluid. The processing system includes a base and a plasma generation device. The base supports the object and the plasma generation device ionizes the first fluid. The plasma generation device includes at least one guiding element comprising a path guiding the first fluid to sequentially flow through a first position and a second position and at least one electrode element including a first electrode corresponding to the first position and a second electrode corresponding to the second position. The first and second electrodes energize the first fluid located between the first and second electrodes to form a second fluid, to thereby utilize the second fluid to perform surfacing, activating, cleaning, photoresist ashing or etching process on the object supported by the base.
    Type: Application
    Filed: November 29, 2006
    Publication date: March 20, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Wen-Tzong Hsieh, Chen-Der Tsai, Chun-Hsien Su, Chih Wei Chen, Chun-Hung Lin
  • Publication number: 20080030672
    Abstract: A liquid crystal (LC) alignment system includes an alignment film having a single or plurality of liquid crystal molecules aligned by a plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a stable pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface by adjusting directions and angles of the liquid crystal molecules, and can attain the effect of alignment stability with a pretilt angle in a single process, thus overcoming the drawbacks of the prior art.
    Type: Application
    Filed: August 3, 2007
    Publication date: February 7, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Yang Lee, Huang-Chin Tang, Ying-Fang Chang, Chen-Der Tsai, Wen-Tzong Hsieh