Patents by Inventor Wen Xiao Chen

Wen Xiao Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6500263
    Abstract: Multiple levels of interlocks are provided relative to gas flow for a chemical vapor deposition chamber. When a chamber lid used for normal processing is in place, no interlock is in effect. When a lid used during maintenance operations is in place, flow of toxic gas to the chamber is interlocked, but flow of purge gas is permitted. When no lid is in place, all gas flow to the chamber is interlocked. The interlock arrangement may be implemented with two switches, both of which are actuated when the lid for normal processing is in place, and only one of which is actuated by the lid for the maintenance process.
    Type: Grant
    Filed: March 26, 2001
    Date of Patent: December 31, 2002
    Assignee: Applied Materials, Inc,
    Inventors: Yu Chang, Wen Xiao Chen, Gwo-Chuan Tzu
  • Publication number: 20020134505
    Abstract: Multiple levels of interlocks are provided relative to gas flow for a chemical vapor deposition chamber. When a chamber lid used for normal processing is in place, no interlock is in effect. When a lid used during maintenance operations is in place, flow of toxic gas to the chamber is interlocked, but flow of purge gas is permitted. When no lid is in place, all gas flow to the chamber is interlocked. The interlock arrangement may be implemented with two switches, both of which are actuated when the lid for normal processing is in place, and only one of which is actuated by the lid for the maintenance process.
    Type: Application
    Filed: March 26, 2001
    Publication date: September 26, 2002
    Inventors: Yu Chang, Wen Xiao Chen, Gwo-Chuan Tzu