Abstract: The present invention discloses a maleimide-alt-trialkylsilylstyrene copolymer having the formula: ##STR1## wherein: R.sub.1 is H or methyl;R.sub.2 is C.sub.1 -C.sub.3 alkyl; andn is an integer such that the copolymer has a weight average molecular weight of 25,000-120,000.The copolymer of formula (I) is useful in the preparation of a photoresist composition. A process for preparing the copolymer of formula (I) is also disclosed.

Abstract: Silicon containing copolymers are mixed with diazonaphthoquinone esters to give UV photoresists for use in microlithography on integrated circuits (IC). The copolymer structure has a thermally resistant group, N-(4-hydroxyphenyl)maleimide, and an oxygen plasma resistant group, para-trialkylsilylstyrene.

Abstract: A polyvinyl alcohol graft terpolymer comprises 70-30% by weight of polyvinyl alcohol and 30-70% by weight of acrylate/maleic anhydride copolymer having 95-30 mole % of acrylate and 50-70 mole % of maleic anhydride, which is prepared by a condensation-coupling reaction through esterification being performed between the hydroxy groups of the polyvinyl alcohol and the anhydride groups of the acrylate/maleic anhydride copolymer. The polyvinyl alcohol graft terpolymer may be further subjected to a heat treatment to have better water resistance and mechanical properties due to the interchain ester linkage between the hydroxyl groups and the anhydride groups therein. Alternatively, the polyvinyl alcohol graft terpolymer may be reacted with an amine to produce a maleamic acid intermediate, and then dehydated to form a maleimide derivative.

Abstract: The present invention provides an ultraviolet-autocurable benzophenone tetracarboxylic dianhydride-based polyurethane acrylate oligomer.