Abstract: A nanomachining method for producing high-aspect ratio precise nanostructures. The method begins by irradiating a wafer with an energetic charged-particle beam. Next, a layer of patterning material is deposited on one side of the wafer and a layer of etch stop or metal plating base is coated on the other side of the wafer. A desired pattern is generated in the patterning material on the top surface of the irradiated wafer using conventional electron-beam lithography techniques. Lastly, the wafer is placed in an appropriate chemical solution that produces a directional etch of the wafer only in the area from which the resist has been removed by the patterning process. The high mechanical strength of the wafer materials compared to the organic resists used in conventional lithography techniques with allows the transfer of the precise patterns into structures with aspect ratios much larger than those previously achievable.

Abstract: An extreme ultraviolet (EUV) AIM tool for both the EUV actinic lithography and high-resolution imaging or inspection is described. This tool can be extended to lithography nodes beyond the 32 nanometer (nm) node covering other short wavelength radiation such as soft X-rays. The metrology tool is preferably based on an imaging optic referred to as an Achromatic Fresnel Optic (AFO). The AFO is a transmissive optic that includes a diffractive Fresnel zone plate lens component and a dispersion-correcting refractive lens component. It retains all of the imaging properties of a Fresnel zone plate lens, including a demonstrated resolution capability of better than 25 nanometers and freedom from image distortion. It overcomes the chromatic aberration of the Fresnel zone plate lens and has a larger usable spectral bandwidth.

Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element are disclosed. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics comprising two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including. gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.

Abstract: A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.

Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.

Abstract: An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used.

Abstract: A nanomachining method for producing high-aspect ratio precise nanostructures. The method begins by irradiating a wafer with an energetic charged-particle beam. Next, a layer of patterning material is deposited on one side of the wafer and a layer of etch stop or metal plating base is coated on the other side of the wafer. A desired pattern is generated in the patterning material on the top surface of the irradiated wafer using conventional electron-beam lithography techniques. Lastly, the wafer is placed in an appropriate chemical solution that produces a directional etch of the wafer only in the area from which the resist has been removed by the patterning process. The high mechanical strength of the wafer materials compared to the organic resists used in conventional lithography techniques with allows the transfer of the precise patterns into structures with aspect ratios much larger than those previously achievable.