Patents by Inventor Wenceslao Cebuhar

Wenceslao Cebuhar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060209314
    Abstract: Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining diffraction orders associated with an ideal mask of a pattern to be printed by the lithography system, and then configuring the states of the SLM pixels to match all the diffraction orders that are relevant in the image formation.
    Type: Application
    Filed: January 27, 2006
    Publication date: September 21, 2006
    Applicant: ASML Holding N.V.
    Inventors: Azat Latypov, Sherman Poultney, Wenceslao Cebuhar
  • Publication number: 20060170617
    Abstract: A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
    Type: Application
    Filed: January 31, 2005
    Publication date: August 3, 2006
    Applicant: ASML Holding N.V.
    Inventors: Azat Latypov, Wenceslao Cebuhar, Jason Hintersteiner
  • Publication number: 20060146308
    Abstract: The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
    Type: Application
    Filed: January 6, 2005
    Publication date: July 6, 2006
    Applicant: ASML Holding N.V.
    Inventors: Wenceslao Cebuhar, Jason Hintersteiner, Stan Janik, Yuli Vladimirsky
  • Patent number: 7061591
    Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: June 13, 2006
    Assignee: ASML Holding N.V.
    Inventors: Arno Bleeker, Wenceslao A. Cebuhar, Jason D. Hintersteiner
  • Publication number: 20060119947
    Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).
    Type: Application
    Filed: January 20, 2006
    Publication date: June 8, 2006
    Applicant: ASML Holding N.V.
    Inventors: Scott Coston, Wenceslao Cebuhar, Jason Hintersteiner
  • Publication number: 20060114546
    Abstract: In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
    Type: Application
    Filed: January 10, 2006
    Publication date: June 1, 2006
    Applicant: ASML Holding N.V.
    Inventors: Wenceslao Cebuhar, Jason Hintersteiner, Azat Latypov, Gerald Volpe
  • Publication number: 20060114438
    Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
    Type: Application
    Filed: January 13, 2006
    Publication date: June 1, 2006
    Applicant: ASML Holding N.V.
    Inventors: Arno Bleeker, Wenceslao Cebuhar, Jason Hintersteiner, Andrew McCullough, Solomon Wasserman
  • Patent number: 7006295
    Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).
    Type: Grant
    Filed: March 25, 2004
    Date of Patent: February 28, 2006
    Assignee: ASML Holding N.V.
    Inventors: Scott Coston, Wenceslao A. Cebuhar, Jason D. Hintersteiner
  • Patent number: 6985280
    Abstract: In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: January 10, 2006
    Assignee: ASML Holding N.V.
    Inventors: Wenceslao A. Cebuhar, Jason D. Hintersteiner, Azat Latypov, Gerald Volpe
  • Publication number: 20050170267
    Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
    Type: Application
    Filed: April 5, 2005
    Publication date: August 4, 2005
    Applicant: ASML Holding N.V.
    Inventors: Arno Bleeker, Wenceslao Cebuhar, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky
  • Publication number: 20050094245
    Abstract: In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
    Type: Application
    Filed: November 5, 2004
    Publication date: May 5, 2005
    Inventors: Wenceslao Cebuhar, Jason Hintersteiner, Azat Latypov, Gerald Volpe
  • Patent number: 6876440
    Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: April 5, 2005
    Assignee: ASML Holding N.V.
    Inventors: Arno Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky
  • Publication number: 20050068467
    Abstract: A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Inventors: Arno Bleeker, Wenceslao Cebuhar, Azat Latypov
  • Publication number: 20050068514
    Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Inventors: Arno Bleeker, Wenceslao Cebuhar, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky
  • Publication number: 20050046819
    Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
    Type: Application
    Filed: September 28, 2004
    Publication date: March 3, 2005
    Inventors: Arno Bleeker, Wenceslao Cebuhar, Jason Hintersteiner, Andrew McCullough, Solomon Wasserman
  • Patent number: 6831768
    Abstract: In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: December 14, 2004
    Assignee: ASML Holding N.V.
    Inventors: Wenceslao A. Cebuhar, Jason D. Hintersteiner, Azat Latypov, Gerald Volpe
  • Publication number: 20040239901
    Abstract: A maskless lithography system and method produces gray scale patterns on objects. The system includes an illumination source (e.g., either pulsed or effectively continuous), an object including an array of exposure areas, an array of spatial light modulators (e.g., either digital, binary, or analog), and a controller. The array of spatial light modulators pattern and direct light from the illumination source to the object. Each of the spatial light modulators have active areas that respectively correspond with one of the exposure areas on the object. The controller controls the array of spatial light modulators, such that the pattern of the light has spatially varying intensities.
    Type: Application
    Filed: May 29, 2003
    Publication date: December 2, 2004
    Applicant: ASML Holding N.V.
    Inventors: Solomon Wasserman, Jason D. Hintersteiner, Wenceslao A. Cebuhar, Gerald T. Volpe
  • Publication number: 20040239908
    Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
    Type: Application
    Filed: May 30, 2003
    Publication date: December 2, 2004
    Applicant: ASML Holding N.V.
    Inventors: Arno Bleeker, Wenceslao A. Cebuhar, Jason D. Hintersteiner, Andrew W. McCullough, Solomon Wasserman
  • Publication number: 20040179270
    Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).
    Type: Application
    Filed: March 25, 2004
    Publication date: September 16, 2004
    Applicant: ASML Holding N.V.
    Inventors: Scott Coston, Wenceslao A. Cebuhar, Jason D. Hintersteiner