Patents by Inventor Wenchao Zhao

Wenchao Zhao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240132152
    Abstract: The present disclosure provides a self-learning collaborative control method for active steering and yaw moment for a motor vehicle, including a first step of constructing fundamental formulas which are stored in a vehicle ECU, and a second step of calculating an active steering angle ?C and a yaw moment Mc on line by the vehicle ECU according to following sub-steps during a driving process of the motor vehicle, and controlling a driving state of the motor vehicle according to ?C and Mc. The second step includes a first sub-step of collecting raw real-time parameter values, a second sub-step of performing calculation by the identifier and the control target reference model, a third sub-step of calculating ?C and Mc. The present disclosure can realize the self-learning collaborative control of active steering and yaw moment without requiring a system control model and correct a driver's steering operation.
    Type: Application
    Filed: December 25, 2023
    Publication date: April 25, 2024
    Inventors: Zhijun Fu, Yaohua Guo, Dengfeng Zhao, Jinquan Ding, Chaohui Liu, Wenbin He, Wenchao Yang, Lei Yao, Fang Zhou, Hui Wang, Wuyi Ming
  • Publication number: 20240134114
    Abstract: A dispersion-compensation microstructure fiber uses pure silica glass as the background material. It includes the core, the first-type defects, the second-type defects and the cladding. The air holes in the fiber cross section are arranged in the equilateral triangle lattice with the same adjacent air-hole to air-hole spacing. The core is formed by omitting 1 air hole. The first-type defects are formed by the 6 air holes locating at the vertices of hexagonal third-layer porous structure surrounding the core and their surrounding background material. The second-type defects are formed by the air holes in the first air-hole layer surrounding each first-type defect and their surrounding background material. The second-type defects act as the porous structure to surround the first-type defects and the fundamental defect modes, and can also combine with the first-type defects to act as the core of the second-order defect modes.
    Type: Application
    Filed: December 22, 2023
    Publication date: April 25, 2024
    Applicant: YANSHAN UNIVERSITY
    Inventors: Wei WANG, Chang ZHAO, Xiaochen KANG, Hongda YANG, Wenchao LI, Zheng LI, Lin SHI
  • Patent number: 11947259
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: April 2, 2024
    Assignee: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang
  • Patent number: 11639331
    Abstract: A diketone oxime ester compound shown in formula I and a manufacturing method therefor, and a photo-curable composition using the compound of formula I as a photoinitiator. The composition has extremely high light sensitivity and relatively low yellowing resistance when applied to prepare a color filter for a light resistance device such as a display screen.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: May 2, 2023
    Assignee: INSIGHT HIGH TECHNOLOGY CO., LTD
    Inventors: Wenchao Zhao, Jiaqi Li, Chenlong Wang
  • Patent number: 11608395
    Abstract: A polyacrylate macromolecular photoinitiator, a synthesis method therefor, and the use thereof. The polyacrylate macromolecular photoinitiator is free of a component having a molecular weight of less than 1000, and can effectively avoid the introduction of a material having a mall molecular weight in the photoinitiator and the odor and migration contamination produced thereby, the general formula thereof being as shown in formula I.
    Type: Grant
    Filed: September 13, 2018
    Date of Patent: March 21, 2023
    Assignee: INSIGHT HIGH TECHNOLOGY CO., LTD
    Inventors: Chenlong Wang, Wenchao Zhao
  • Publication number: 20220334355
    Abstract: The disclosure discloses an optical imaging system, which sequentially includes from an object side to an image side along an optical axis: a diaphragm; a first lens with a positive refractive power; a second lens with a refractive power; a third lens with a refractive power; a fourth lens with a refractive power; a fifth lens with a refractive power; a sixth lens with a refractive power, an object-side surface thereof is a convex surface; and a seventh lens with a positive refractive power, wherein an effective focal length f of the optical imaging system and an entrance pupil diameter (EPD) of the optical imaging system satisfy: f/EPD<1.3; and TTL is an on-axis distance from an object-side surface of the first lens to an imaging surface, Semi-FOV is a half of a maximum field of view of the optical imaging system, and TTL and Semi-FOV satisfy: 3.0 mm<TTLĂ—Tan(Semi-FOV)<4.0 mm.
    Type: Application
    Filed: April 12, 2022
    Publication date: October 20, 2022
    Inventors: Wenchao ZHAO, Yabin HU, Jianke WENREN, Fujian DAI, Liefeng ZHAO
  • Publication number: 20220185775
    Abstract: Provided in the present invention is a novel diaroyl carbazole compound, used together with a carbazolyl oxime ester photo initiator to show a significant synergistic initiation effect in a photoresist composition; the best sensitising effect is shown when the molar ratio of the diaroyl carbazole compound and the carbazolyl oxime ester photoinitiator is 0.1-1.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 16, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Wenchao Zhao, Jiaqi Li, Zhongli Ma, Chenlong Wang, Yonglin Wang
  • Publication number: 20220179309
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 9, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang
  • Publication number: 20210198193
    Abstract: Involved are a diketone oxime ester compound shown in formula I and a manufacturing method therefor, and a photo-curable composition using the compound of formula I as a photoinitiator. The composition has extremely high light sensitivity and relatively low yellowing resistance when applied to prepare a color filter for a light resistance device such as a display screen.
    Type: Application
    Filed: August 30, 2018
    Publication date: July 1, 2021
    Inventors: Wenchao ZHAO, Jiaqi LI, Chenlong WANG
  • Publication number: 20210147585
    Abstract: A polyacrylate macromolecular photoinitiator, a synthesis method therefor, and the use thereof. The polyacrylate macromolecular photoinitiator is free of a component having a molecular weight of less than 1000, and can effectively avoid the introduction of a material having a mall molecular weight in the photoinitiator and the odor and migration contamination produced thereby, the general formula thereof being as shown in formula I.
    Type: Application
    Filed: September 13, 2018
    Publication date: May 20, 2021
    Applicant: Insight High Technology Co., Ltd
    Inventors: Chenlong WANG, Wenchao ZHAO
  • Patent number: 9409861
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: August 9, 2016
    Assignee: Insight High Technology (Beijing) Co. Ltd.
    Inventors: Wenchao Zhao, Zhongli Ma, Jiaqi Li, Lixiu Yao, Jue Zhang, Weijing Hu, Jing Li, Yonglin Wang
  • Publication number: 20150246878
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Application
    Filed: May 14, 2015
    Publication date: September 3, 2015
    Inventors: Wenchao ZHAO, Zhongli MA, Jiaqi LI, Lixiu YAO, Jue ZHANG, Weijing HU, Jing LI, Yonglin WANG
  • Patent number: 9061979
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: June 23, 2015
    Assignee: Insight High Technology (Beijing) Co. Ltd.
    Inventors: Wenchao Zhao, Zhongli Ma, Jiaqi Li, Lixiu Yao, Jue Zhang, Weijing Hu, Jing Li, Yonglin Wang