Abstract: Provided is a method of laser interference lithography, including: performing an interference exposure on a wafer coated with a photoresist; and performing a patterned flood exposure on the interference-exposed wafer, wherein the performing the flood exposure includes: determining a first light field distribution in the interference-exposed wafer; determining a light field distribution of the floodlight source as a second light field distribution based on the first light field distribution, an expected pattern distribution, and parameters of the floodlight source used for the flood exposure; and patterning the light field distribution of the floodlight source based on the second light field distribution, and controlling the floodlight source having the patterned light field distribution to perform the flood exposure on the interference-exposed wafer, so as to form the expected pattern distribution in the flood-exposed wafer.

Abstract: A plasmonic sensor with gradient nanostructures and a method of use thereof is provided. The gradient of shapes will induce different spectral responses at different region of the sensor and show different colors. When there is a change in the environment properties of a substance, such as refractive index, gas concentration or ion density changes, the sensor displays different images, e.g., redial intensity displays and radial color displays. An image recognition based method can be used to extract the environment property with high accuracy according to the sensor image.

Abstract: A method for selective metallization includes: selectively adsorbing catalytic nanoparticles onto an imprint mold to form a selectively adsorbed catalytic nanoparticle (SACN) mold; using the SACN mold in an imprinting process to synchronously transfer a pattern and the catalytic nanoparticles onto a film; separating the film from the SACN mold; and selectively depositing metal onto the film based on the pattern transferred to the film.

Abstract: A method for selective metallization includes: selectively adsorbing catalytic nanoparticles onto an imprint mold to form a selectively adsorbed catalytic nanoparticle (SACN) mold; using the SACN mold in an imprinting process to synchronously transfer a pattern and the catalytic nanoparticles onto a film; separating the film from the SACN mold; and selectively depositing metal onto the film based on the pattern transferred to the film.

Abstract: A plasmonic sensor with gradient nanostructures and a method of use thereof is provided. The gradient of shapes will induce different spectral responses at different region of the sensor and show different colors. When there is a change in the environment properties of a substance, such as refractive index, gas concentration or ion density changes, the sensor displays different images, e.g., redial intensity displays and radial color displays. An image recognition based method can be used to extract the environment property with high accuracy according to the sensor image.

Abstract: A transparent conductive film with a metal mesh embedded in a substrate and a method of fabrication thereof is provided. The metal mesh has a cap that is pressed and embedded in a substrate or a deformable material on a substrate, providing superior mechanical stability by mechanical interlocking. The embedding mechanism also provides superior chemical and environmental stability. A fabrication method is provided and includes a vacuum-free and low-cost process for large-volume manufacturing of the transparent conductive film with tunable performance.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed.

Abstract: A laser interference lithography device using all-fiber-optic components is disclosed. In the said all-fiber laser interference lithography device, an input coupling fiber receives the coherent laser beam from a laser source and sends it to an optical fiber splitter. The optical fiber splitter splits the input laser beam into at least two sub-beams and outputs the multiple sub-beams through multiple output optical fiber. Adjustable fiber holders, each carrying one output fiber, tune the position and angle of output optical fibers to achieve desired interference patterns on a substrate.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed. Applications of the structures to enhance the optical signals in the detection of molecules and other materials on a structure surface, such as fluorescence, photoluminescence and surface enhanced Raman Scattering (SERS) are also disclosed.

Abstract: A laser interference lithography device using all-fiber-optic components is disclosed. In the said all-fiber laser interference lithography device, an input coupling fiber receives the coherent laser beam from a laser source and sends it to an optical fiber splitter. The optical fiber splitter splits the input laser beam into at least two sub-beams and outputs the multiple sub-beams through multiple output optical fiber.

Abstract: A transparent conductive film with a metal mesh embedded in a substrate and a method of fabrication thereof is provided. The metal mesh has a cap that is pressed and embedded in a substrate or a deformable material on a substrate, providing superior mechanical stability by mechanical interlocking. The embedding mechanism also provides superior chemical and environmental stability. A fabrication method is provided and includes a vacuum-free and low-cost process for large-volume manufacturing of the transparent conductive film with tunable performance.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed. Applications of the structures to enhance the optical signals in the detection of molecules and other materials on a structure surface, such as fluorescence, photoluminescence and surface enhanced Raman Scattering (SERS) are also disclosed.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed. Applications of the structures to enhance the optical signals in the detection of molecules and other materials on a structure surface, such as fluorescence, photoluminescence and surface enhanced Raman Scattering (SERS) are also disclosed.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed.

Abstract: Microstructures and nanostructures (100) consisting of a substrate (110), an array of pillars (120) capped by metallic disc (130), metallic dots (clusters or granules) (140) disposed on the sidewalls of the pillars, and a metallic backplane (150) that can interact to enhance a local electric field, the absorption of the light, and the radiation of the light are disclosed. Methods to fabricate the structures (100) are also disclosed. Applications of the structures to enhance the optical signals in the detection of molecules and other materials on a structure surface, such as fluorescence, photoluminescence and surface enhanced Raman Scattering (SERS) are also disclosed.

Abstract: A flat-panel display system and method are disclosed. The system includes a display controller to generate image data. The system also includes a plurality of memristive pixel cells arranged in a plurality of rows and in a plurality of columns. Each of the plurality of memristive pixel cells includes a memristive device to control a respective pixel associated with the flat panel display based on the image data.

Abstract: This invention relates to the fabrication of large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. This can be accomplished by forming a pattern of simple nanoscale features and converting the simple features into more complex nanoscale features by a process comprising shadow deposition. The process may also include steps of uniform deposition, etching and smoothing depending on the shape of the complex features.

Abstract: This invention relates to the fabrication of large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. This can be accomplished by forming a pattern of simple nanoscale features and converting the simple features into more complex nanoscale features by a process comprising shadow deposition. The process may also include steps of uniform deposition, etching and smoothing depending on the shape of the complex features.