Patents by Inventor Wendy Gehoel-Van Ansem

Wendy Gehoel-Van Ansem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070046915
    Abstract: A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
    Type: Application
    Filed: February 16, 2006
    Publication date: March 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Marcel Mathijs Dierichs, Wendy Gehoel-Van Ansem
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050007570
    Abstract: A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
    Type: Application
    Filed: May 25, 2004
    Publication date: January 13, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Marcel Mathijs Dierichs, Wendy Gehoel-Van Ansem