Abstract: A touch device is disposed on a substrate having a plurality of scan lines. The touch device comprises a plurality of readout lines and a plurality of sensors. The readout lines and the scan lines are intersected with each other, and the sensors are electrically coupled to the corresponding scan lines and the corresponding readout lines respectively. A scan signal is introduced into the scan lines in sequence to control whether turning on the sensors, and the scan signal comprises at least one first turn-on pulse and a second turn-on pulse to simultaneously turn on at least two sensors which are electrically coupled to different scan lines.

Abstract: A dual view display structure and a method for producing the same are provided. First, a display panel is provided. Then, a patterned barrier layer is formed on a transparent substrate. The transparent substrate with the patterned barrier layer is attached to the display panel. Because there is a gap between the display panel and the patterned barrier layer, a liquid transparent material is injected into the gap to form a transparent material layer to fill the gap. The invention can not only increase the viewing angles of the dual view display, but also increase the production yield.

Abstract: A display apparatus is disclosed, and comprises a display panel and a lens. On the display panel, there are a width-fixed pixel zone, a width-variating pixel zone and a border zone arranged sequentially from the center to the edges of the display panel, wherein there are a plurality of width-fixed pixels disposed in the width-fixed zone, and there are a plurality of width-variating pixel groups disposed in the width-variating pixel zone, and the widths of the width-variating pixel groups are present in a first decreasing sequence. The lens has a focus-length-variating portion and a planar portion, wherein the planar portion is aligned with the width-fixed pixel zone, and the focus-length-variating portion is disposed to correspond to the border zone and the width-variating pixel zone. The focus lengths of the focus-length-variating portion corresponding to the width-variating pixel groups are present in a second decreasing sequence.

Abstract: A touch display panel including a first substrate, a second substrate and a liquid crystal layer is provided. The first substrate includes sensing areas and a non-sensing area outside the sensing areas. Each sensing area is provided with a first electrode thereon. The second substrate includes main spacers, sensing protrusions, first sub-spacers and second sub-spacers. The main spacers are connected to the non-sensing area. The sensing protrusions are corresponding to the sensing area and respectively have a second electrode. A sensing gap exists between each second electrode and the corresponding first electrode. The first sub-spacers are corresponding to the non-sensing area and respectively keep a first sub-spacer gap from the first substrate. The second sub-spacers are corresponding to the non-sensing area and respectively keep a second sub-spacer gap from the first substrate. The sensing gap is greater than the first sub-spacer gap and less than the second sub-spacer gap.

Abstract: A touch device is disposed on a substrate having a plurality of scan lines. The touch device comprises a plurality of readout lines and a plurality of sensors. The readout lines and the scan lines are intersected with each other, and the sensors are electrically coupled to the corresponding scan lines and the corresponding readout lines respectively. A scan signal is introduced into the scan lines in sequence to control whether turning on the sensors, and the scan signal comprises at least one first turn-on pulse and a second turn-on pulse to simultaneously turn on at least two sensors which are electrically coupled to different scan lines.

Abstract: A method for manufacturing a liquid crystal display, the method includes steps of depositing a transparent conductive layer, forming a pixel electrode, and four bottom layers, depositing a semiconductor insulation layer on the pixel electrode and the four bottom layers, defining the semiconductor insulation layer to form two contact openings two of the bottom layers, depositing and defining two top layers and two scanning lines both with an indentation at an edge thereof, and the indentations face the first pixel electrode by an opposite direction, and forming four metal-insulation-metal (MIM) diodes.

Abstract: A display apparatus is disclosed, and comprises a display panel and a lens. On the display panel, there are a width-fixed pixel zone, a width-variating pixel zone and a border zone arranged sequentially from the center to the edges of the display panel, wherein there are a plurality of width-fixed pixels disposed in the width-fixed zone, and there are a plurality of width-variating pixel groups disposed in the width-variating pixel zone, and the widths of the width-variating pixel groups are present in a first decreasing sequence. The lens has a focus-length-variating portion and a planar portion, wherein the planar portion is aligned with the width-fixed pixel zone, and the focus-length-variating portion is disposed to correspond to the border zone and the width-variating pixel zone. The focus lengths of the focus-length-variating portion corresponding to the width-variating pixel groups are present in a second decreasing sequence.

Abstract: A touch display panel including a first substrate, a second substrate and a liquid crystal layer is provided. The first substrate includes sensing areas and a non-sensing area outside the sensing areas. Each sensing area is provided with a first electrode thereon. The second substrate includes main spacers, sensing protrusions, first sub-spacers and second sub-spacers. The main spacers are connected to the non-sensing area. The sensing protrusions are corresponding to the sensing area and respectively have a second electrode. A sensing gap exists between each second electrode and the corresponding first electrode. The first sub-spacers are corresponding to the non-sensing area and respectively keep a first sub-spacer gap from the first substrate. The second sub-spacers are corresponding to the non-sensing area and respectively keep a second sub-spacer gap from the first substrate. The sensing gap is greater than the first sub-spacer gap and less than the second sub-spacer gap.

Abstract: A method for manufacturing a liquid crystal display device is disclosed, comprising the following steps: (a) providing a substrate having a transparent electrode layer and a first metal layer, wherein the transparent electrode layer is sandwiched in between the first metal layer and the substrate; (b) defining a patterned area having a thin film diode area and a pixel area by a first mask; (c) forming a first insulating layer and a second metal layer on the patterned area having the thin film diode area and the pixel area in sequence, wherein the first insulating layer is sandwiched in between the second metal layer and the first metal layer; and (d) defining the thin film diode area and the pixel area by a second mask, and removing the second metal layer, the first insulating layer, and the first metal layer on the pixel area to expose the transparent electrode layer.

Abstract: A method for manufacturing a liquid crystal display, the method includes steps of depositing a transparent conductive layer, forming a pixel electrode, and four bottom layers, depositing a semiconductor insulation layer on the pixel electrode and the four bottom layers, defining the semiconductor insulation layer to form two contact openings two of the bottom layers, depositing and defining two top layers and two scanning lines both with an indentation at an edge thereof, and the indentations face the first pixel electrode by an opposite direction, and forming four metal-insulation-metal (MIM) diodes.

Abstract: Active devices in a thin film diode (TFD) liquid crystal display (LCD) panel used to control liquid crystal are formed by a metal layer, a transparent conductive layer, and an insulating layer sequentially on a substrate, wherein the metal layer is used as transmitting signal and the transparent conductive layer is used as bottom metal layer of metal-insulator-metal (MIM) thin film diode. The metal layer, the transparent conductive layer, and the insulating layer are defined with desired patterns. Further, a dielectric layer is formed over the substrate, metal layer, the transparent conductive layer, and the insulating layer, and defined to form the locations of electrode terminal and MIM thin film diode by using lithographic process. Next, another transparent conductive layer is formed on the dielectric layer and defined to form a pixel electrode and top metal layer of the MIM thin film diode by using lithographic process.

Abstract: Metal-Insulator-Metal (MIM) diodes in back-to-back thin film diode (TFD) liquid crystal display (LCD) device are formed on dual selective lines respectively. A transparent conductive layer on a first substrate comprises a pixel electrode, a first bottom layer, a second bottom layer, a third bottom layer, and a fourth bottom layer. A semiconductor insulator layer with a first contact hole on the first bottom layer and a second contact hole on the third bottom layer covers the first substrate and the transparent conductive layer.

Abstract: A dual view display structure and a method for producing the same are provided. First, a display panel is provided. Then, a patterned barrier layer is formed on a transparent substrate. The transparent substrate with the patterned barrier layer is attached to the display panel. Because there is a gap between the display panel and the patterned barrier layer, a liquid transparent material is injected into the gap to form a transparent material layer to fill the gap. The invention can not only increase the viewing angles of the dual view display, but also increase the production yield.

Abstract: Active devices in a thin film diode (TFD) liquid crystal display (LCD) panel used to control liquid crystal are formed by a metal layer, a transparent conductive layer, and an insulating layer sequentially on a substrate, wherein the metal layer is used as transmitting signal and the transparent conductive layer is used as bottom metal layer of metal-insulator-metal (MIM) thin film diode. The metal layer, the transparent conductive layer, and the insulating layer are defined with desired patterns. Further, a dielectric layer is formed over the substrate, metal layer, the transparent conductive layer, and the insulating layer, and defined to form the locations of electrode terminal and MIM thin film diode by using lithographic process. Next, another transparent conductive layer is formed on the dielectric layer and defined to form a pixel electrode and top metal layer of the MIM thin film diode by using lithographic process.

Abstract: Active devices in a thin film diode (TFD) liquid crystal display (LCD) panel used to control liquid crystal are formed by a metal layer, a transparent conductive layer, and an insulating layer sequentially on a substrate, wherein the metal layer is used as transmitting signal and the transparent conductive layer is used as bottom metal layer of metal-insulator-metal (MIM) thin film diode. The metal layer, the transparent conductive layer, and the insulating layer are defined with desired patterns. Further, a dielectric layer is formed over the substrate, metal layer, the transparent conductive layer, and the insulating layer, and defined to form the locations of electrode terminal and MIM thin film diode by using lithographic process. Next, another transparent conductive layer is formed on the dielectric layer and defined to form a pixel electrode and top metal layer of the MIM thin film diode by using lithographic process.

Abstract: A method for manufacturing a liquid crystal display device is disclosed, comprising the following steps: (a) providing a substrate having a transparent electrode layer and a first metal layer, wherein the transparent electrode layer is sandwiched in between the first metal layer and the substrate; (b) defining a patterned area having a thin film diode area and a pixel area by a first mask; (c) forming a first insulating layer and a second metal layer on the patterned area having the thin film diode area and the pixel area in sequence, wherein the first insulating layer is sandwiched in between the second metal layer and the first metal layer; and (d) defining the thin film diode area and the pixel area by a second mask, and removing the second metal layer, the first insulating layer, and the first metal layer on the pixel area to expose the transparent electrode layer.

Abstract: A method for manufacturing liquid crystal display substrates comprises the steps of: (a) providing a substrate having a transparent electrode layer and a metal layer; (b) forming a patterned photoresist layer through half-tone or diffraction; (c) defining signal line area and thin film diode area, or pixel area and conductive electrode-lines by etching; and (d) forming an oxidized layer on partial surface of the metal layer. The disclosure here provides a patterning process of lithography and etching with one photolithography of one single mask in the manufacturing of liquid crystal display substrates. Furthermore, the method disclosed here can effectively increase the yield of manufacturing, and reduce the cost of manufacturing.

Abstract: Active devices in a thin film diode (TFD) liquid crystal display (LCD) panel used to control liquid crystal are formed by a metal layer, a transparent conductive layer, and an insulating layer sequentially on a substrate, wherein the metal layer is used as transmitting signal and the transparent conductive layer is used as bottom metal layer of metal-insulator-metal (MIM) thin film diode. The metal layer, the transparent conductive layer, and the insulating layer are defined with desired patterns. Further, a dielectric layer is formed over the substrate, metal layer, the transparent conductive layer, and the insulating layer, and defined to form the locations of electrode terminal and MIM thin film diode by using lithographic process. Next, another transparent conductive layer is formed on the dielectric layer and defined to form a pixel electrode and top metal layer of the MIM thin film diode by using lithographic process.

Abstract: A method for manufacturing liquid crystal display substrates comprises the steps of: (a) providing a substrate having a transparent electrode layer and a metal layer; (b) forming a patterned photoresist layer through half-tone or diffraction; (c) defining signal line area and thin film diode area, or pixel area and conductive electrode-lines by etching; and (d) forming an oxidized layer on partial surface of the metal layer. The disclosure here provides a patterning process of lithography and etching with one photolithography of one single mask in the manufacturing of liquid crystal display substrates. Furthermore, the method disclosed here can effectively increase the yield of manufacturing, and reduce the cost of manufacturing.

Abstract: Metal-Insulator-Metal (MIM) diodes in back-to-back thin film diode (TFD) liquid crystal display (LCD) device are formed on dual selective lines respectively. A transparent conductive layer on a first substrate comprises a pixel electrode, a first bottom layer, a second bottom layer, a third bottom layer, and a fourth bottom layer. A semiconductor insulator layer with a first contact hole on the first bottom layer and a second contact hole on the third bottom layer covers the first substrate and the transparent conductive layer.