Patents by Inventor Wenjie Jin

Wenjie Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12276918
    Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.
    Type: Grant
    Filed: June 17, 2021
    Date of Patent: April 15, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Mauritius Gerardus Elisabeth Schneiders, Koos Van Berkel, Wenjie Jin
  • Publication number: 20250103855
    Abstract: A method of generating control actions for controlling a production system, such as by transmitting the control actions to a control system of the production system. The method includes receiving, by a memory unit, a set of observation data characterizing a current state of the production system; processing, by a first neural network module of the memory unit, an input based on at least part of the observation data to generate encoded observation data; updating, by a second neural network module of the memory unit, history information stored in an internal memory of the second module using an input based on at least part of the observation data; obtaining, based on the encoded observation data and the updated history information, state data; and generating, based on the state data, one or more control actions.
    Type: Application
    Filed: December 15, 2022
    Publication date: March 27, 2025
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Wenjie JIN
  • Publication number: 20250028298
    Abstract: Dynamic aberration control in a semiconductor manufacturing process is described. In some embodiments, wavefront data representing a wavefront provided by an optical projection system of a semiconductor processing apparatus may be received. Wavefront drift may be determined based on a comparison of the wavefront data and target wavefront data. Based on the wavefront drift, one or more process parameters may be determined. The one or more process parameters include parameters associated with a thermal device, where the thermal device is configured to provide thermal energy to the optical projection system during operation.
    Type: Application
    Filed: November 30, 2022
    Publication date: January 23, 2025
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Gerui LIU, Wenjie JIN, Dezheng SUN
  • Patent number: 12044951
    Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.
    Type: Grant
    Filed: October 7, 2020
    Date of Patent: July 23, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Wenjie Jin, Nan Lin, Christina Lynn Porter, Petrus Wilhelmus Smorenburg
  • Patent number: 12013505
    Abstract: A device includes sample tray units, a sample tray transporting unit, a sample tray handling unit, and a sample tray radiation stage unit. The sample tray units are configured to load samples. The sample tray transporting unit is configured to carry a sample tray unit to a radiation room. The sample tray handling unit is between the sample tray transporting unit and the sample tray radiation stage unit, and is configured to transfer the sample tray unit on the sample tray transporting unit to the sample tray radiation stage unit or return the sample tray unit on the sample tray radiation stage unit to the sample tray transporting unit. The sample tray radiation stage unit is configured to carry the sample tray unit and move the samples to be irradiated in the sample tray unit to a particle beam radiation area to receive radiation.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: June 18, 2024
    Assignee: INSTITUTE OF MODERN PHYSICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Libin Zhou, Ruishi Mao, Xin Li, Zhiguo Xu, Yan Du, Yucong Chen, Wenjian Li, Xincai Kang, Wenjie Jin, Zulong Zhao, Kun Wei
  • Publication number: 20230288818
    Abstract: Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.
    Type: Application
    Filed: June 14, 2021
    Publication date: September 14, 2023
    Applicant: ASML Netherlands B,V.
    Inventors: Wenjie JIN, Petrus Wilhelmus SMORENBURG, Nan LIN, Christina Lynn PORTER, David O'DWYER, Cord Louis ARNOLD, Sjoerd Nicolaas,Lambertus DONDERS
  • Publication number: 20230273527
    Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.
    Type: Application
    Filed: June 17, 2021
    Publication date: August 31, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Mauritius Gerardus Elisabeth SCHNEIDERS, Koos VAN BERKEL, Wenjie JIN
  • Publication number: 20220382124
    Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.
    Type: Application
    Filed: October 7, 2020
    Publication date: December 1, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Wenjie JIN, Nan LIN, Christina Lynn PORTER, Petrus Wilhelmus SMORENBURG
  • Publication number: 20220179110
    Abstract: A device includes sample tray units, a sample tray transporting unit, a sample tray handling unit, and a sample tray radiation stage unit. The sample tray units are configured to load samples. The sample tray transporting unit is configured to carry a sample tray unit to a radiation room. The sample tray handling unit is between the sample tray transporting unit and the sample tray radiation stage unit, and is configured to transfer the sample tray unit on the sample tray transporting unit to the sample tray radiation stage unit or return the sample tray unit on the sample tray radiation stage unit to the sample tray transporting unit. The sample tray radiation stage unit is configured to carry the sample tray unit and move the samples to be irradiated in the sample tray unit to a particle beam radiation area to receive radiation.
    Type: Application
    Filed: March 13, 2020
    Publication date: June 9, 2022
    Inventors: Libin ZHOU, Ruishi MAO, Xin LI, Zhiguo XU, Yan DU, Yucong CHEN, Wenjian LI, Xincai KANG, Wenjie JIN, Zulong ZHAO, Kun WEI
  • Publication number: 20220122184
    Abstract: Embodiments offer monitoring, visualization, and/or error handling for large volumes of electronic documents. A document handling system may visualize documents in other than table format (e.g., a flow chart view presenting documents in the context of a process for which they are created and used). Certain embodiments may provide automated recognition of document errors based upon classification of error types. Such monitoring may involve grouping documents together according to error type. This allows efficient correction of errors in grouped documents, rather than requiring the user to correct each document individually. Specific embodiments may further provide suggestions of solutions for error correction. Such intelligent recommendation can be based upon supervised learning models trained with data corpuses of prior correction efforts involving compliance with legal requirements and/or internal guidelines.
    Type: Application
    Filed: October 20, 2020
    Publication date: April 21, 2022
    Inventors: Jing Jing, Chunyan Xu, Xiaotao Ren, Chunxia Bi, Junjie Ge, Wenjie Jin