Patents by Inventor Wenjie Jin
Wenjie Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12276918Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.Type: GrantFiled: June 17, 2021Date of Patent: April 15, 2025Assignee: ASML Netherlands B.V.Inventors: Mauritius Gerardus Elisabeth Schneiders, Koos Van Berkel, Wenjie Jin
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Publication number: 20250103855Abstract: A method of generating control actions for controlling a production system, such as by transmitting the control actions to a control system of the production system. The method includes receiving, by a memory unit, a set of observation data characterizing a current state of the production system; processing, by a first neural network module of the memory unit, an input based on at least part of the observation data to generate encoded observation data; updating, by a second neural network module of the memory unit, history information stored in an internal memory of the second module using an input based on at least part of the observation data; obtaining, based on the encoded observation data and the updated history information, state data; and generating, based on the state data, one or more control actions.Type: ApplicationFiled: December 15, 2022Publication date: March 27, 2025Applicant: ASML NETHERLANDS B.V.Inventor: Wenjie JIN
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Publication number: 20250028298Abstract: Dynamic aberration control in a semiconductor manufacturing process is described. In some embodiments, wavefront data representing a wavefront provided by an optical projection system of a semiconductor processing apparatus may be received. Wavefront drift may be determined based on a comparison of the wavefront data and target wavefront data. Based on the wavefront drift, one or more process parameters may be determined. The one or more process parameters include parameters associated with a thermal device, where the thermal device is configured to provide thermal energy to the optical projection system during operation.Type: ApplicationFiled: November 30, 2022Publication date: January 23, 2025Applicant: ASML NETHERLANDS B.V.Inventors: Duan-Fu Stephen HSU, Gerui LIU, Wenjie JIN, Dezheng SUN
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Patent number: 12044951Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.Type: GrantFiled: October 7, 2020Date of Patent: July 23, 2024Assignee: ASML Netherlands B.V.Inventors: Wenjie Jin, Nan Lin, Christina Lynn Porter, Petrus Wilhelmus Smorenburg
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Patent number: 12013505Abstract: A device includes sample tray units, a sample tray transporting unit, a sample tray handling unit, and a sample tray radiation stage unit. The sample tray units are configured to load samples. The sample tray transporting unit is configured to carry a sample tray unit to a radiation room. The sample tray handling unit is between the sample tray transporting unit and the sample tray radiation stage unit, and is configured to transfer the sample tray unit on the sample tray transporting unit to the sample tray radiation stage unit or return the sample tray unit on the sample tray radiation stage unit to the sample tray transporting unit. The sample tray radiation stage unit is configured to carry the sample tray unit and move the samples to be irradiated in the sample tray unit to a particle beam radiation area to receive radiation.Type: GrantFiled: March 13, 2020Date of Patent: June 18, 2024Assignee: INSTITUTE OF MODERN PHYSICS, CHINESE ACADEMY OF SCIENCESInventors: Libin Zhou, Ruishi Mao, Xin Li, Zhiguo Xu, Yan Du, Yucong Chen, Wenjian Li, Xincai Kang, Wenjie Jin, Zulong Zhao, Kun Wei
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Publication number: 20230288818Abstract: Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.Type: ApplicationFiled: June 14, 2021Publication date: September 14, 2023Applicant: ASML Netherlands B,V.Inventors: Wenjie JIN, Petrus Wilhelmus SMORENBURG, Nan LIN, Christina Lynn PORTER, David O'DWYER, Cord Louis ARNOLD, Sjoerd Nicolaas,Lambertus DONDERS
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Publication number: 20230273527Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.Type: ApplicationFiled: June 17, 2021Publication date: August 31, 2023Applicant: ASML Netherlands B.V.Inventors: Mauritius Gerardus Elisabeth SCHNEIDERS, Koos VAN BERKEL, Wenjie JIN
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Publication number: 20220382124Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.Type: ApplicationFiled: October 7, 2020Publication date: December 1, 2022Applicant: ASML Netherlands B.V.Inventors: Wenjie JIN, Nan LIN, Christina Lynn PORTER, Petrus Wilhelmus SMORENBURG
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Publication number: 20220179110Abstract: A device includes sample tray units, a sample tray transporting unit, a sample tray handling unit, and a sample tray radiation stage unit. The sample tray units are configured to load samples. The sample tray transporting unit is configured to carry a sample tray unit to a radiation room. The sample tray handling unit is between the sample tray transporting unit and the sample tray radiation stage unit, and is configured to transfer the sample tray unit on the sample tray transporting unit to the sample tray radiation stage unit or return the sample tray unit on the sample tray radiation stage unit to the sample tray transporting unit. The sample tray radiation stage unit is configured to carry the sample tray unit and move the samples to be irradiated in the sample tray unit to a particle beam radiation area to receive radiation.Type: ApplicationFiled: March 13, 2020Publication date: June 9, 2022Inventors: Libin ZHOU, Ruishi MAO, Xin LI, Zhiguo XU, Yan DU, Yucong CHEN, Wenjian LI, Xincai KANG, Wenjie JIN, Zulong ZHAO, Kun WEI
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Publication number: 20220122184Abstract: Embodiments offer monitoring, visualization, and/or error handling for large volumes of electronic documents. A document handling system may visualize documents in other than table format (e.g., a flow chart view presenting documents in the context of a process for which they are created and used). Certain embodiments may provide automated recognition of document errors based upon classification of error types. Such monitoring may involve grouping documents together according to error type. This allows efficient correction of errors in grouped documents, rather than requiring the user to correct each document individually. Specific embodiments may further provide suggestions of solutions for error correction. Such intelligent recommendation can be based upon supervised learning models trained with data corpuses of prior correction efforts involving compliance with legal requirements and/or internal guidelines.Type: ApplicationFiled: October 20, 2020Publication date: April 21, 2022Inventors: Jing Jing, Chunyan Xu, Xiaotao Ren, Chunxia Bi, Junjie Ge, Wenjie Jin