Patents by Inventor Wenli Collision

Wenli Collision has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for detecting the endpoint of a photoresist stripping process
    Publication number: 20020148811
    Abstract: Methods for detecting the endpoint of a photoresist stripping process provide O for reaction with the photoresist for a wafer to be stripped of photoresist. NO is also supplied for reaction with O not reacted with the photoresist. After substantially all the photoresist is stripped from the wafer, the rate of a reaction of O and NO to form NO2 increases, which increases the intensity of emitted light. An operation of detecting this increase in light intensity signals the endpoint of the photoresist stripping process.
    Type: Application
    Filed: June 5, 2002
    Publication date: October 17, 2002
    Inventors: Tuqiang Ni, Wenli Collision