Abstract: The present disclosure provides in some embodiments a method for manufacturing an OLED display substrate, including a step of forming a PS on a substrate with an anode and a step of forming a pattern of a pixel definition layer. The step of forming the PS is performed no later than the step of forming the pattern of the pixel definition layer. According to the present disclosure, the PS is able to be formed prior to the formation of the pattern of the pixel definition layer, or the PS and the pattern of the pixel definition layer are formed simultaneously through one single patterning process.

Abstract: The present invention provides a method for manufacturing an array substrate, including; a step of providing a substrate; a step of making an electrode layer on the substrate; and a step of making a spacer layer and a spacer column on the electrode layer; wherein the spacer column is made by heat-treatment while the spacer layer is being formed, and a method for manufacturing an array substrate. The method for manufacturing an array substrate provided by the present invention can not only shorten the production cycle, lower the production cost, but also avoid the threshold voltage drift of the TFT due to the irradiation of a large area of ultraviolet rays.