Patents by Inventor Wentian ZHOU
Wentian ZHOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240046620Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.Type: ApplicationFiled: August 3, 2023Publication date: February 8, 2024Inventors: Wentian ZHOU, Liangjiang YU, Teng WANG, Lingling PU, Wei FANG
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Patent number: 11769317Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.Type: GrantFiled: December 18, 2019Date of Patent: September 26, 2023Assignee: ASML Netherlands B.V.Inventors: Wentian Zhou, Liangjiang Yu, Teng Wang, Lingling Pu, Wei Fang
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Patent number: 11756187Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.Type: GrantFiled: January 3, 2022Date of Patent: September 12, 2023Assignee: ASML Netherlands B.V.Inventors: Lingling Pu, Wei Fang, Nan Zhao, Wentian Zhou, Teng Wang, Ming Xu
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Patent number: 11694312Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.Type: GrantFiled: May 5, 2021Date of Patent: July 4, 2023Assignee: ASML Netherlands B.V.Inventors: Wei Fang, Ruochong Fei, Lingling Pu, Wentian Zhou, Liangjiang Yu, Bo Wang
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Publication number: 20220237759Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.Type: ApplicationFiled: January 3, 2022Publication date: July 28, 2022Applicant: ASML Netherlands B.V.Inventors: Lingling PU, Wei FANG, Nan ZHAO, Wentian ZHOU, Teng WANG, Ming XU
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Patent number: 11216938Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.Type: GrantFiled: August 28, 2019Date of Patent: January 4, 2022Assignee: ASML Netherlands B.V.Inventors: Lingling Pu, Wei Fang, Nan Zhao, Wentian Zhou, Teng Wang, Ming Xu
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Publication number: 20210350507Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.Type: ApplicationFiled: May 5, 2021Publication date: November 11, 2021Inventors: Wei FANG, Ruochong FEI, Lingling PU, Wentian ZHOU, Liangjiang YU, Bo WANG
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Publication number: 20200211178Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.Type: ApplicationFiled: December 18, 2019Publication date: July 2, 2020Inventors: Wentian ZHOU, Liangjiang YU, Teng WANG, Lingling PU, Wei FANG
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Publication number: 20200074610Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.Type: ApplicationFiled: August 28, 2019Publication date: March 5, 2020Inventors: Lingling PU, Wei FANG, Nan ZHAO, Wentian ZHOU, Teng WANG, Ming XU