Patents by Inventor Wenyi XIE

Wenyi XIE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ATOMIC LAYER ETCHING OF METALS USING NOVEL CO-REACTANTS AS HALOGENATING AGENTS
    Publication number: 20250109501
    Abstract: The disclosed and claimed subject matter relates to thermal atomic layer etch (ALE) processing of metals and alloys thereof (e.g., cobalt and cobalt alloys) using thionyl chloride (SOCl2) or a combination of thionyl chloride and pyridine.
    Type: Application
    Filed: February 1, 2023
    Publication date: April 3, 2025
    Inventors: Ravindra KANJOLIA, Jacob WOODRUFF, Mansour MOINPOUR, Charles DEZELAH, Holger SAARE, Wenyi XIE, Gregory PARSONS, Martin MCBRIARTY
  • ATOMIC LAYER ETCHING OF METAL OXIDES USING NOVEL CO-REACTANTS AS HALOGENATING AGENTS FOR SEMICONDUCTOR FABRICATION
    Publication number: 20230402290
    Abstract: The disclosed and claimed subject matter relates to thermal ALE processing of metal oxide films using one or more fluorinating agent and one or more chlorinating agent.
    Type: Application
    Filed: March 21, 2023
    Publication date: December 14, 2023
    Inventors: Ravindra KANJOLIA, Jacob WOODRUFF, Mansour MOINPOUR, Charles DEZELAH, Wenyi XIE, Holger SAARE, Gregory PARSONS