Patents by Inventor Weoun-ju Kim

Weoun-ju Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoacid generator, chemically amplified resist composition including the same, and associated methods
    Patent number: 8536347
    Abstract: A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A?, where R5 is a C1-C10 alkyl group, and A? is a counter-ion.
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: September 17, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yool Kang, Hak-won Kim, Weoun-ju Kim, Seong-woon Choi, Hyun-woo Kim, Hai-sub Na, Kyoung-taek Kim
  • Photoacid generator, chemically amplified resist composition including the same, and associated methods
    Publication number: 20090131684
    Abstract: A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A?, where R5 is a C1-C10 alkyl group, and A? is a counter-ion.
    Type: Application
    Filed: September 29, 2008
    Publication date: May 21, 2009
    Inventors: Yool Kang, Hak-won Kim, Weoun-ju Kim, Seong-woon Choi, Hyun-woo Kim, Hai-sub Na, Kyoung-taek Kim