Patents by Inventor Werner Filtvedt

Werner Filtvedt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162428
    Abstract: The present invention concerns a method for manufacturing microcrystalline nanoscaled silicon particles, the particles made thereof, and a secondary electrochemical cell utilising the particles as the active material of the negative electrode of the secondary electrochemical cell, wherein the silicon particles comprises a chemical compound of formula: Si(1?x)Mx, where 0.005?x?0.20 and M is at least one substitution element chosen from; C, N, or a mixture thereof, and wherein the particles have been subject to a heat treatment of 800 to 900° C. and transformed into a microcrystalline phase having crystallite sizes in the range of 1 to 15 nm.
    Type: Application
    Filed: March 25, 2022
    Publication date: May 16, 2024
    Applicant: CENATE AS
    Inventors: Martin Kirkengen, Werner Filtvedt, Erik Sauar
  • Publication number: 20230092576
    Abstract: A method for manufacturing predominantly amorphous silicon-containing particles includes a chemical compound of formula: Si(1?x)Cx, where 0.005?x<0.05. The particles, when subjected to XRD analysis applying unmonochromated CuK? radiation, exhibit one peak at around 28° and one peak at around 52°. Both peaks have a Full Width at Half Maximum of at least 5° when using Gaussian peak fitting. The method includes forming a homogeneous gas mixture of a first precursor gas of a silicon containing compound and at least one second precursor gas of a substitution element M containing compound, injecting the homogeneous gas mixture of the first and second precursor gases into a reactor space where the precursor gases are heated to a temperature in the range of from 700 to 900° C. so that the precursor gases react and form particles, and collecting and cooling the particles to a temperature in the range of from ambient temperature up to about 350° C.
    Type: Application
    Filed: February 12, 2021
    Publication date: March 23, 2023
    Applicant: CENATE AS
    Inventors: Martin Kirkengen, Erik Sauar, Werner Filtvedt
  • Publication number: 20200067092
    Abstract: Method for producing a powder comprising particles (26) comprising amorphous, micro- or nano-crystalline Silicon nitride. The method comprises the steps of supplying a reactant gas (12) containing Silicon, and a reactant gas (12) containing Nitrogen, to a reaction chamber (16) of a reactor (10), and heating said reactant gases (12) to a temperature in the range of 510° C. to 1300° C. which is sufficient for thermal decomposition or reduction of the reactant gases (12) to take place inside the reaction chamber (16) to thereby produce a powder of amorphous, micro- or nano-crystalline particles (26) comprising Silicon nitride (SiNx) in which the atomic ratio of Silicon to Nitrogen is in the range 1:0.2 to 1:0.9. The produced powder of particles (26) may be used to produce a film, an electrode, such as an anode, for a battery, such as a Lithium ion battery.
    Type: Application
    Filed: May 30, 2017
    Publication date: February 27, 2020
    Inventors: Martin Kirkengen, Asbjorn Ulvestad, Hanne F Andersen, Werner Filtvedt, Arve Holt, Hallgeir Klette, Trygve Mongstad, Jan Petter Maehlen, Ornulf Nordseth, Thomas Preston
  • Patent number: 9440210
    Abstract: Embodiments provide a gas distribution arrangement, a device for handling a chemical reaction comprising such a gas distribution arrangement and a method of providing a chemical reaction chamber with a gas. The distribution arrangement comprises a distribution plate for separating a chemical reaction chamber from a gas inlet area and having a first side arranged to face the chemical reaction chamber and a second side arranged to face the gas inlet area and comprising a set of through holes stretching between the first and the second side, where the first side of the plate comprises a first material surrounding the holes and having a first thermal conductivity, and the plate also comprises a second material forming a base structure also surrounding the holes and having a second thermal conductivity.
    Type: Grant
    Filed: May 11, 2012
    Date of Patent: September 13, 2016
    Assignee: Institutt for Energiteknikk
    Inventors: Werner Filtvedt, Arve Holt
  • Publication number: 20140127116
    Abstract: Embodiments provide a gas distribution arrangement, a device for handling a chemical reaction comprising such a gas distribution arrangement and a method of providing a chemical reaction chamber with a gas. The distribution arrangement comprises a distribution plate for separating a chemical reaction chamber from a gas inlet area and having a first side arranged to face the chemical reaction chamber and a second side arranged to face the gas inlet area and comprising a set of through holes stretching between the first and the second side, where the first side of the plate comprises a first material surrounding the holes and having a first thermal conductivity, and the plate also comprises a second material forming a base structure also surrounding the holes and having a second thermal conductivity.
    Type: Application
    Filed: May 11, 2012
    Publication date: May 8, 2014
    Applicant: Institutt For Energiteknikk
    Inventors: Werner Filtvedt, Arve Holt