Patents by Inventor Werner Riethmueller

Werner Riethmueller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7919345
    Abstract: A method is disclosed of fabricating micromechanical components provided with free-standing microstructures or membranes with predetermined mechanical stress, by initially depositing a sacrificial layer on a substrate followed by depositing a polysilicon layer on the sacrificial layer by a gaseous phase deposition and, finally, at least partial removal of the sacrificial layer. During deposition of the polysilicon layer, the process pressure selected determined the type of stress in the polysilicon layer, and the value of the stress is set by the process temperature selected. The process pressure is above the pressure range used in LPCVD reactors.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: April 5, 2011
    Assignee: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
    Inventors: Mario Kirsten, Peter Lange, Beatrice Wenk, Werner Riethmueller