Abstract: A method of producing a thin coating by plasma-assisted chemical vapor phase deposition from a carbonaceous and metalliferous gas phase of a predetermined composition on a substrate surface especially in the form of a diamond-like carbon-silicon-hydrogen compound, wherein for the coloration the optical thickness of the coating or of one layer region or of a plurality of layer regions of the coating each, is predetermined in one single vacuum coating process in that due to interferences of the first order and/or of a higher order the desired color impression results at the coating or at its layer region(s) according to the principle of interference at thin films, and in the portion of the coating adjacent to the substrate surface first of all a non-colorating layer region, providing hardness and wear resistance of the complete coating, is produced with a larger thickness in relation to the colorating region or regions, wherein preferably shortly before achieving the total thickness of the coating the compositi

Abstract: Diamond-like, transparent, clear and uncolored carbon coatings with low internal stresses are generated on substrates by plasma discharge from the gas phase. For this purpose, a hydrocarbon gas or a mixture of hydrocarbon gases and pure hydrogen is admitted onto the substrate to be coated which is at room temperature. Around the substrate an oxygen-free plasma discharge is produced by high-frequency excitation which is sustained by the gases admitted. The gases are excited, dissociated ionized and accelerated toward the substrate during plasma discharge.