Patents by Inventor Werner Schoene

Werner Schoene has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8138251
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: March 20, 2012
    Assignee: Lummus Novolen Technology GmbH
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Publication number: 20120046396
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: November 2, 2011
    Publication date: February 23, 2012
    Applicant: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Patent number: 8076429
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: December 13, 2011
    Assignee: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Publication number: 20100234507
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: March 11, 2009
    Publication date: September 16, 2010
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Publication number: 20050197456
    Abstract: A polypropylene resin composition includes a random copolymer of propylene, at least one C4-C10 ?-olefin, and ethylene, wherein the ratio of the weight percentage of ethylene in the polypropylene random copolymer relative to the sum of the weight percentages of the C4-C10 ?-olefins is less than or equal to 1, and, from 10 to 20,000 ppm of at least one nucleating agent.
    Type: Application
    Filed: December 23, 2004
    Publication date: September 8, 2005
    Inventors: Jose Nicolini, Jose Pezzutti, Ralph-Dieter Maier, Vassilios Galiatsatos, Werner Schoene
  • Patent number: 5536789
    Abstract: Propylene polymers have a molecular weight ratio Q (M.sub.w /M.sub.n) of from 6 to 30 and are obtainable by Ziegler-Natta polymerization in the presence of hydrogen as molecular weight regulator and are particularly suitable for the production of films and moldings.
    Type: Grant
    Filed: April 24, 1995
    Date of Patent: July 16, 1996
    Assignee: BASF Aktiengesellschaft
    Inventors: Harald Schwager, Peter Koelle, Rueger Schlund, Ralf Zolk, Juergen Kerth, Guenther Schweter, Klaus-Dieter Hungenberg, Werner Schoene
  • Patent number: 5451468
    Abstract: A packaging film containsa) a sealing layer of a mixture of from 50 to 80% by weight of a random terpolymer (I) of from 90 to 97% by weight of propylene, from 2 to 6% by weight of ethylene and from 1 to 6% by weight of a C.sub.4 -C.sub.10 -alk-1-ene and from 20 to 50% by weight of at least one ethylene polymer (II)b) and a substrate layer of a thermoplastic polymer.The novel packaging film possesses in particular good sealability over a wide temperature range.
    Type: Grant
    Filed: September 14, 1993
    Date of Patent: September 19, 1995
    Assignee: BASF Aktiensgesellschaft
    Inventors: Erhard Seiler, Werner Schoene, Uwe Ballerstedt