Patents by Inventor Werner Stockum

Werner Stockum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching pastes for titanium oxide surfaces
    Publication number: 20060118759
    Abstract: The present invention relates to novel etching media in the form of printable and dispensable etching pastes for the etching of titanium oxide surfaces of the general composition TixOy, and to the use of these etching pastes in a process for the etching of titanium oxide surfaces
    Type: Application
    Filed: July 30, 2003
    Publication date: June 8, 2006
    Inventors: Sylke Klein, Armin Kubelbeck, Werner Stockum
  • Etching pastes for silicon surfaces and layers
    Publication number: 20050247674
    Abstract: The invention relates to novel etching media in the form of etching pastes for etching selected areas or the entire area of silicon surfaces and layers, in addition to the use of said media.
    Type: Application
    Filed: August 8, 2003
    Publication date: November 10, 2005
    Applicant: Merck Patent GmbH
    Inventors: Armin Kubelbeck, Sylke Klein, Werner Stockum
  • Combined etching and doping substances
    Publication number: 20040242019
    Abstract: The invention concerns etching and doping substances free of hydrochloric/fluoride acid used for etching inorganic layers as well as for doping subjacent layers. The invention also concerns a method wherein said substances are used.
    Type: Application
    Filed: April 12, 2004
    Publication date: December 2, 2004
    Inventors: Sylke Klein, Armin Kubelbeck, Werner Stockum, Wilfried Schmidt, Berthold Schum
  • Dopant pastes for the production of p, p+, and n, n+ regions in semiconductors
    Patent number: 6695903
    Abstract: The invention relates to novel boron, phosphorus or boron-aluminium dopant pastes for the production of p, p+ and n, n+ regions in monocrystalline and polycrystalline Si wafers, and of corresponding pastes for use as masking pastes in semiconductor fabrication, power electronics or in photovoltaic applications.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: February 24, 2004
    Assignee: Merck Patent GmbH
    Inventors: Armin Kübelbeck, Claudia Zielinski, Lilia Heider, Werner Stockum
  • Etching pastes for inorganic surfaces
    Publication number: 20030160026
    Abstract: The invention relates to novel etching media in the form of printable, homogenous, particle-free etching pastes with non-Newtonian flow properties for the etching of inorganic surfaces, in particular, of glasses, preferably on silicon oxide and silicon nitride based glass and other silicon oxide and silicon nitride based systems and layers thereof. The invention further relates to the use of said etching media.
    Type: Application
    Filed: February 25, 2003
    Publication date: August 28, 2003
    Inventors: Sylke Klein, Lilia Heider, Claudia Zielinski, Armin Kuebelbeck, Werner Stockum