Patents by Inventor Wes McKinsey

Wes McKinsey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8767179
    Abstract: An imaging method in scanning photolithography includes application of different quantity first and second exposure doses of electromagnetic radiation through a reticle to a photosensitive substrate while scanning across a substrate exposure field along a direction of scan. The first dose spans entirely across the width of the exposure field during the scan and occurs all along the exposure field. The second dose covers less than the entire width of the exposure field during the scan, and is applied at a location spaced along the direction of scan from where the first dose is being applied while the first dose is being applied. Other embodiments are disclosed, including apparatus embodiments.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: July 1, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Wes McKinsey
  • Publication number: 20110141443
    Abstract: An imaging method in scanning photolithography includes application of different quantity first and second exposure doses of electromagnetic radiation through a reticle to a photosensitive substrate while scanning across a substrate exposure field along a direction of scan. The first dose spans entirely across the width of the exposure field during the scan and occurs all along the exposure field. The second dose covers less than the entire width of the exposure field during the scan, and is applied at a location spaced along the direction of scan from where the first dose is being applied while the first dose is being applied. Other embodiments are disclosed, including apparatus embodiments.
    Type: Application
    Filed: December 15, 2009
    Publication date: June 16, 2011
    Inventor: Wes McKinsey