Patents by Inventor Whee Won Jin

Whee Won Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of depositing a ruthenium metal thin film or ruthenium oxide thin film
    Patent number: 9347133
    Abstract: A method of depositing a ruthenium metal thin film or ruthenium oxide thin film comprising a ruthenium compound used for depositing metallic Ru or RuO2 thin film on a substrate via atomic layer deposition, and the ruthenium compound represented by Chemical Formula 1, wherein L is a ligand selected from the group consisting of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene, and isoprene.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: May 24, 2016
    Assignee: HANSOL CHEMICAL CO., LTD.
    Inventors: Jung Woo Park, Jun Young Kim, Kwang deok Lee, Whee Won Jin
  • RUTHENIUM COMPOUND HAVING SUPERIOR STEP COVERAGE AND THIN FILM DEPOSITED USING SAME
    Publication number: 20150050431
    Abstract: The present invention relates to a ruthenium compound including a specific ligand structure of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene or isoprene and having superior thermal stability, vaporizing property and step coverage, and a thin film deposited using same.
    Type: Application
    Filed: March 30, 2012
    Publication date: February 19, 2015
    Applicant: HANSOL CHEMICAL CO., LTD.
    Inventors: Jung Woo Park, Jun Young Kim, Kwang deok Lee, Whee Won Jin