Patents by Inventor Whewell Allyn

Whewell Allyn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • t-butyl cinnamate polymers and their use in photoresist compositions
    Patent number: 6312870
    Abstract: A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units: wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R1=H, methyl, or CH2OR4; R4=H or C1-C4 alkyl group; R2=H, methyl, CH2OR4, CH2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR5; R5=C1-C4 alkyl group; and R3=isobomyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.
    Type: Grant
    Filed: July 19, 2000
    Date of Patent: November 6, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Sanjay Malik, Lawrence Ferreira, Jeffrey Eisele, Whewell Allyn