Patents by Inventor Whi-kun Yi

Whi-kun Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120042952
    Abstract: A silicon solar cell including a carbon nanotube layer is provided. The carbon nanotube layer is disposed on at least one of front and back surfaces of a p-n junction silicon substrate which includes a p-type silicon layer and an n-type silicon layer. Accordingly, the intensity of the electric field applied to devices may be increased due to introduction of the carbon nanotube layer, resulting in improved photoelectric conversion efficiency.
    Type: Application
    Filed: April 29, 2010
    Publication date: February 23, 2012
    Applicant: Industry-University Cooperation Foundation Hanyang University
    Inventors: Whi-Kun Yi, Jung-Woo Lee
  • Patent number: 7078007
    Abstract: A carbon nanotube manufacturing method is provided. In the carbon nanotube manufacturing method, carbon nanoparticles are dispersed in a strong acid solution and heated at a predetermined temperature under reflux to form carbon nanotubes from the carbon nanoparticles. The carbon nanotubes can be simply produced on a mass-scale at low costs by using the strong acid solution.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: July 18, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se-gi Yu, Whi-kun Yi, Jeong-hee Lee, Yong-wan Jin, Tae-won Jeong
  • Patent number: 7025652
    Abstract: An electron amplifier and a method of manufacturing the same are provided. The electron amplifier includes a substrate in which a plurality of through holes are formed, a resistive layer deposited on the sidewalls of the through holes, an electron emissive layer including carbon nanotubes which is deposited on the resistive layer, and an electrode layer formed on each of the upper and lower sides of the substrate. Because the electron emissive layer of the electron amplifier is uniform and provides a high electron emission efficiency, the electron amplification efficiency is improved. The electron amplifier manufacturing method enables economical mass production of electron amplifiers.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: April 11, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-na Heo, Whi-kun Yi, Jeong-hee Lee, Se-gi Yu, Tae-won Jeong, Chang-soo Lee
  • Publication number: 20050200254
    Abstract: An electron amplifier and a method of manufacturing the same are provided. The electron amplifier includes a substrate in which a plurality of through holes are formed, a resistive layer deposited on the sidewalls of the through holes, an electron emissive layer including carbon nanotubes which is deposited on the resistive layer, and an electrode layer formed on each of the upper and lower sides of the substrate. Because the electron emissive layer of the electron amplifier is uniform and provides a high electron emission efficiency, the electron amplification efficiency is improved. The electron amplifier manufacturing method enables economical mass production of electron amplifiers.
    Type: Application
    Filed: February 4, 2005
    Publication date: September 15, 2005
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung-na Heo, Whi-kun Yi, Jeong-hee Lee, Se-gi Yu, Tae-won Jeong, Chang-soo Lee
  • Patent number: 6903500
    Abstract: A field emitter device including carbon nanotubes each of which has a protective membrane is provided. The protective membrane is formed of a nitride, a carbide, or an oxide. Suitable nitrides for the protective membrane include boron nitride, aluminum nitride, boron carbon nitride, and gallium nitride. The protective membrane protects the carbon nanotubes from damage due to arcing or an unnecessary remaining gas and thus improves field emission characteristics and stability of the field emitter device.
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: June 7, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-won Jeong, Ji-beom Yoo, Whi-kun Yi, Jeong-hee Lee, Se-gi Yu, Chang-soo Lee, Jung-na Heo
  • Patent number: 6870308
    Abstract: An electron amplifier and a method of manufacturing the same are provided. The electron amplifier includes a substrate in which a plurality of through holes are formed, a resistive layer deposited on the sidewalls of the through holes, an electron emissive layer including carbon nanotubes which is deposited on the resistive layer, and an electrode layer formed on each of the upper and lower sides of the substrate. Because the electron emissive layer of the electron amplifier is uniform and provides a high electron emission efficiency, the electron amplification efficiency is improved. The electron amplifier manufacturing method enables economical mass production of electron amplifiers.
    Type: Grant
    Filed: February 20, 2003
    Date of Patent: March 22, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-na Heo, Whi-kun Yi, Jeong-hee Lee, Se-gi Yu, Tae-won Jeong, Chang-soo Lee
  • Publication number: 20030173884
    Abstract: An electron amplifier and a method of manufacturing the same are provided. The electron amplifier includes a substrate in which a plurality of through holes are formed, a resistive layer deposited on the sidewalls of the through holes, an electron emissive layer including carbon nanotubes which is deposited on the resistive layer, and an electrode layer formed on each of the upper and lower sides of the substrate. Because the electron emissive layer of the electron amplifier is uniform and provides a high electron emission efficiency, the electron amplification efficiency is improved. The electron amplifier manufacturing method enables economical mass production of electron amplifiers.
    Type: Application
    Filed: February 20, 2003
    Publication date: September 18, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung-na Heo, Whi-kun Yi, Jeong-hee Lee, Se-gi Yu, Tae-won Jeong, Chang-soo Lee
  • Publication number: 20030141179
    Abstract: A carbon nanotube manufacturing method is provided. In the carbon nanotube manufacturing method, carbon nanoparticles are dispersed in a strong acid solution and heated at a predetermined temperature under reflux to form carbon nanotubes from the carbon nanoparticles. The carbon nanotubes can be simply produced on a mass-scale at low costs by using the strong acid solution.
    Type: Application
    Filed: January 30, 2003
    Publication date: July 31, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Se-Gi Yu, Whi-Kun Yi, Jeong-Hee Lee, Yong-Wan Jin, Tae-Won Jeong
  • Publication number: 20030127960
    Abstract: A field emitter device including carbon nanotubes each of which has a protective membrane is provided. The protective membrane is formed of a nitride, a carbide, or an oxide. Suitable nitrides for the protective membrane include boron nitride, aluminum nitride, boron carbon nitride, and gallium nitride. The protective membrane protects the carbon nanotubes from damage due to arcing or an unnecessary remaining gas and thus improves field emission characteristics and stability of the field emitter device.
    Type: Application
    Filed: January 8, 2003
    Publication date: July 10, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Tae-Won Jeong, Ji-Beom Yoo, Whi-Kun Yi, Jeong-Hee Lee, Se-Gi Yu, Chang-Soo Lee, Jung-Na Heo
  • Patent number: 5900163
    Abstract: A method for etching a layer of a microelectronic structure includes the steps of masking the layer to be etched so that predetermined portions of the layer are exposed, and providing an etching gas. An additional gas is also provided wherein the additional gas generates a compound having a carbene structure when exposed to a plasma discharge. A plasma of the etching gas and the additional gas is generated to thereby etch the exposed portions of the layer and to form the compound having a carbene structure. A polymer can thus be formed from the compound having the carbene structure on the sidewalls of the etched portions of the layer. Accordingly, the profile of the etched layer can be improved.
    Type: Grant
    Filed: January 16, 1997
    Date of Patent: May 4, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Whi-kun Yi, Dai-sik Moon, Sung-kyeong Kim, Kyung-hoon Kim, Gyu-hwan Kwag