Patents by Inventor Wiilfred Edward Endendijk

Wiilfred Edward Endendijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic Apparatus
    Publication number: 20190369508
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: August 13, 2019
    Publication date: December 5, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik KOEVOETS, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wiilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Corlelis Gerardus Van Der Sanden