Patents by Inventor Wilbert Jan Mestrom
Wilbert Jan Mestrom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10394141Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: July 27, 2017Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Publication number: 20170322499Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: July 27, 2017Publication date: November 9, 2017Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 9753383Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: June 13, 2013Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Fuel system for lithographic apparatus, EUV source, lithographic apparatus and fuel filtering method
Patent number: 9648714Abstract: A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir (40) for retaining a volume of fuel (42), a nozzle (32), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement (44) which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.Type: GrantFiled: February 6, 2013Date of Patent: May 9, 2017Assignee: ASML Netherlands B.V.Inventors: Wilbert Jan Mestrom, Gerardus Hubertus Petrus Maria Swinkels -
Patent number: 9510432Abstract: The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analyzing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.Type: GrantFiled: February 7, 2013Date of Patent: November 29, 2016Assignee: ASML Netherlands B.V.Inventors: Antonius Theodorus Wilhelmus Kempen, Johan Frederik Dijksman, Wilbert Jan Mestrom
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Publication number: 20150338753Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: June 13, 2013Publication date: November 26, 2015Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry LEBETSKI, Wilbert Jan MESTROM, Wim Ronald KAMPINGA, Jan Okke NIEUWENKAMP, Jacob BRINKERT, Henricus Jozef CASTELIJNS, Nicolaas TEN KATE, Hendrikus Gijsbertus SCHIMMEL, Hans JANSEN, Dennis Jozef Maria PAULUSSEN, Brian Vernon VIRGO, Reinier Theodorus Martinus JILISEN, Ramin BADIE, Albert Pieter RIJPMA, Johannes Christiaan Leonardus FRANKEN, Peter VAN PUTTEN, Gerrit VAN DER STRAATEN
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Patent number: 9164403Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.Type: GrantFiled: December 8, 2010Date of Patent: October 20, 2015Assignee: ASML Netherlands B.V.Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
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Patent number: 9007560Abstract: A radiation source is disclosed that comprises a reservoir that retains a volume of fuel, a nozzle configured to direct a stream of fuel towards a plasma formation location, a laser configured to generate a radiation generating plasma, and a fuel contamination control arrangement. The contamination control arrangement comprises a magnetic field generation element for generating a magnetic field; an electric field generation element for generating an electric field, the magnetic field generation element and the electric field generation element together configured to ensure that the magnetic field and the electric field overlap at a location of contamination within the fuel, and to ensure that lines of flux of the magnetic field and electric field are non-parallel at that location to control movement of the contamination.Type: GrantFiled: May 25, 2012Date of Patent: April 14, 2015Assignee: ASML Netherlands B.V.Inventors: Wilbert Jan Mestrom, Gerardus Hubertus Petrus Maria Swinkels
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Fuel System for Lithographic Apparatus, EUV Source, Lithographic Apparatus and Fuel Filtering Method
Publication number: 20150070675Abstract: A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir (40) for retaining a volume of fuel (42), a nozzle (32), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement (44) which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.Type: ApplicationFiled: February 6, 2013Publication date: March 12, 2015Applicant: ASML Netherlands B.V.Inventors: Wilbert Jan Mestrom, Gerardus Hubertus Petrus Maria Swinkels -
Patent number: 8598551Abstract: An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.Type: GrantFiled: November 29, 2010Date of Patent: December 3, 2013Assignee: ASML Netherlands B.V.Inventors: Wilbert Jan Mestrom, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Erik Petrus Buurman
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Publication number: 20130077069Abstract: A radiation source is disclosed that comprises a reservoir that retains a volume of fuel, a nozzle configured to direct a stream of fuel towards a plasma formation location, a laser configured to generate a radiation generating plasma, and a fuel contamination control arrangement. The contamination control arrangement comprises a magnetic field generation element for generating a magnetic field; an electric field generation element for generating an electric field, the magnetic field generation element and the electric field generation element together configured to ensure that the magnetic field and the electric field overlap at a location of contamination within the fuel, and to ensure that lines of flux of the magnetic field and electric field are non-parallel at that location to control movement of the contamination.Type: ApplicationFiled: May 25, 2012Publication date: March 28, 2013Applicant: ASML Netherlands B.V.Inventors: Wilbert Jan MESTROM, Gerardus Hubertus Petrus Maria Swinkels
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Publication number: 20120295205Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.Type: ApplicationFiled: December 8, 2010Publication date: November 22, 2012Applicant: ASML Netherlands B.V.Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
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Publication number: 20120280148Abstract: An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.Type: ApplicationFiled: November 30, 2010Publication date: November 8, 2012Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Erik Petrus Buurman, Wilbert Jan Mestrom
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Publication number: 20120280149Abstract: An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.Type: ApplicationFiled: November 29, 2010Publication date: November 8, 2012Applicant: ASML Netherlands B.V.Inventors: Wilbert Jan Mestrom, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Erik Petrus Buurman