Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

Abstract: A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.

Abstract: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

Abstract: According to an aspect of the present invention, a method of controlling a measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed. The method includes, for a sequence of a plurality of individually controllable elements: directing a measurement beam of radiation at an individually controllable element of the plurality of individually controllable elements; and detecting the measurement beam once it has been re-directed by the individually controllable element, wherein the sequence in which the method is undertaken for the plurality of individually controllable elements is related to the orientation of the plurality of individually controllable elements when the plurality of individually controllable elements are oriented to control a distribution of a beam of radiation.

Abstract: A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.

Abstract: A lithographic optical system is presented herein. The optical system comprises a housing with two optically transparent windows and at least one moveable lens therein, as well as at least one other optical element outside said housing. By providing at least one optical element outside the housing, possible deleterious influences thereof on the optical quality of the moveable lens may be diminished. The housing with the moveable lens may be purged, and may be provided with a linear motor and a gas bearing for contactless moving of the lens.