Patents by Inventor Wilfrid B. Veldkamp
Wilfrid B. Veldkamp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5682265Abstract: Optical apparatus for dispersing a visible light spectrum into primary color bands and directing each color band into a specific pixelated cell of a passive display. The apparatus includes an array of refractive microlenses arranged parallel to the plane of the passive display such as a liquid crystal display and a diffraction grating arranged parallel and in close proximity to the lens array. The microlenses focus visible light onto the display while the diffraction grating separates the visible light into primary color bands in different diffraction orders such that the colors are directed to and transmitted through the corresponding specific pixelated cells.Type: GrantFiled: February 18, 1994Date of Patent: October 28, 1997Assignee: Massachusetts Institute of TechnologyInventors: Michael W. Farn, Wilfrid B. Veldkamp
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Patent number: 5218471Abstract: The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.Type: GrantFiled: December 2, 1991Date of Patent: June 8, 1993Assignee: Massachusetts Institute of TechnologyInventors: Gary J. Swanson, Wilfrid B. Veldkamp
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Patent number: 5161059Abstract: A high-efficiency, diffractive optical element having at least one surface including multilevel steps, the steps determined by calculating equiphase boundaries utilizing a disclosed equation and algorithm. The optical element can be adapted to correct for chromatic and/or spherical aberration, and can be used in UV lithographic apparatus.Type: GrantFiled: August 29, 1989Date of Patent: November 3, 1992Assignee: Massachusetts Institute of TechnologyInventors: Gary J. Swanson, Wilfrid B. Veldkamp
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Patent number: 4994664Abstract: A detector array including a substrate having an array of diffractive lenses formed on the top side of the substrate and an array of sensor elements formed on the backside of the substrate. The sensor elements within the sensor array are oriented on the backside so that each sensor is aligned to receive light from a corresponding diffractive lens of the lens array. The detector array may also include a second substrate having an array of diffractive elements formed on one of its surfaces, the second substrate being disposed above and in proximity to the top side of the other substrate so that the elements on the second substrate are substantially aligned with corresponding sensor elements and diffractive lenses on the other substrate.Type: GrantFiled: March 27, 1989Date of Patent: February 19, 1991Assignee: Massachusetts Institute of TechnologyInventor: Wilfrid B. Veldkamp
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Patent number: 4895790Abstract: The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.Type: GrantFiled: September 21, 1987Date of Patent: January 23, 1990Assignee: Massachusetts Institute of TechnologyInventors: Gary J. Swanson, Wilfrid B. Veldkamp
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Patent number: 4846552Abstract: The high diffraction efficiency regime of binary gratings occurs at periodicities on the order of a wavelength in order to produce grating which diffract radiation with efficiencies of greater than 90%, a fabrication procedure is disclosed which uses halographic and very large scale integration techniques which allow fine control over the periodicity and depth parameters to produce binary planar optical elements having a ratio of .lambda./T greater than one (where .lambda. equals the wavelength of an illuminating wavefront, and T equals the grating periodicity). Additionally, the disclosed process produces high optical quality diffractive elements with phase precision of as high as .lambda./100. These diffractive elements include laser beam multiplexers, beam profile shapers, and binary lenses which are lossless optical transfer functions.Type: GrantFiled: February 9, 1988Date of Patent: July 11, 1989Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Wilfrid B. Veldkamp, Gary J. Swanson
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Patent number: 4813762Abstract: A diffractive lenslet array receives light from multiple lasers. The lenslet array is spaced apart from a partially reflecting mirror by a distance Z=nd.sup.2 /.lambda. where n is an integer or half integer, .lambda. is the laser wavelength and d is the spacing of the lenslets in the array. In a preferred embodiment the apparatus is a unitary design in which the lenslets are etched into one surface of a substrate and a parallel surface is coated to form the partially reflecting mirror. The lenslets abut one another to produce a fill factor (percentage of array containing light) close to one and each of the lenslets is a multistep diffractive lens. Diffractive speading over a round trip distance from lasers to mirror and back again causes feedback light from a single lenslet to couple into adjacent lenslets.Type: GrantFiled: February 11, 1988Date of Patent: March 21, 1989Assignee: Massachusetts Institute of TechnologyInventors: James R. Leger, Wilfrid B. Veldkamp, Miles L. Scott
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Patent number: 4649351Abstract: The disclosed apparatus includes a diffraction grating illuminated by a plurality of lasers. Apparatus is provided for summing the plurality of lasers coherently by, (a) phase locking the plurality of lasers and by, (b) diffracting the plurality of beams into a single beam. The diffraction grating has a configuration to generate upon illumination substantially equal intensities of diffraction orders corresponding to the number of lasers while suppressing higher unwanted orders. The phase locking can be accomplished by a single master laser, or by a cavity mirror to generate reference beams. Then, the output beams of the plurality of lasers propagating in the reverse direction are coherently superimposed by that grating. It is preferred that the diffraction grating be binary. Both one and two-dimensional diffraction grating arrays are disclosed.Type: GrantFiled: October 19, 1984Date of Patent: March 10, 1987Assignee: Massachusetts Institute of TechnologyInventors: Wilfrid B. Veldkamp, James R. Leger, Gary J. Swanson
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Patent number: 4410237Abstract: The intensity profile of a beam of electromagnetic waves such as a laser beam is shaped by means of a diffraction grating and/or prism in the beam path. In one embodiment, beams exhibiting Gaussian energy intensity profiles undergo an energy redistribution to approximately uniform profiles. A reflective or transmissive surface relief grating is employed with phase steps generally periodic except at the pattern center where a pattern phase reversal occurs. Prisms are cut and oriented relative to the incoming beam to operate at the Brewster's angle for compressing or expanding the beam with minimum losses.Type: GrantFiled: September 26, 1980Date of Patent: October 18, 1983Assignee: Massachusetts Institute of TechnologyInventor: Wilfrid B. Veldkamp
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Patent number: 4305666Abstract: A system to achieve heterodyne detection of optical (i.e., infrared, visible and ultraviolet) signal wavefront is disclosed. The system employs a holographic phase grating that, when illuminated by laser radiation, will generate a plurality of wavefronts each of which has a predetermined spatial distribution of amplitude and phase. The grating is part of an optical local oscillator that includes a laser that illuminates the holographic phase grating.Type: GrantFiled: October 24, 1979Date of Patent: December 15, 1981Assignee: Massachusetts Institute of TechnologyInventors: Richard J. Becherer, Wilfrid B. Veldkamp
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Patent number: RE36352Abstract: The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.Type: GrantFiled: June 7, 1995Date of Patent: October 26, 1999Assignee: Massachusetts Institute of TechnologyInventors: Gary J. Swanson, Wilfrid B. Veldkamp