Abstract: An apparatus for the vacuum treatment of substrates in a vacuum chamber includes a substrate support device with a pylon which can be rotated about a longitudinal axis and has holding means for substrates and a plasma discharge device assigned to the pylon. The plasma discharge device includes more than two plate-shaped electrodes having excitation areas, the excitation areas of which are all oriented in the direction of the pylon and a power supply device for the excitation of a plasma discharge, by at least one electrical voltage applied to at least two of the electrodes, is provided, the excited plasma acting at least on parts of the pylon and on substrates that can be arranged on them. A process performs the vacuum coating by the apparatus.

Abstract: An apparatus for the vacuum treatment of substrates in a vacuum chamber includes a substrate support device with a pylon which can be rotated about a longitudinal axis and has holding means for substrates and a plasma discharge device assigned to the pylon. The plasma discharge device includes more than two plate-shaped electrodes having excitation areas, the excitation areas of which are all oriented in the direction of the pylon and a power supply device for the excitation of a plasma discharge, by at least one electrical voltage applied to at least two of the electrodes, is provided, the excited plasma acting at least on parts of the pylon and on substrates that can be arranged on them. A process performs the vacuum coating by the apparatus.

Abstract: In a method for the coating of substrates made of plastic, with a light-reflecting layer, preferably an aluminum layer, and another layer placed between the substrate and the light-reflecting layer, the additional layer, which has a high barrier effect to substances which migrate or evolve gases from the plastic, is a highly crosslinked hydrocarbon layer, a silicon dioxide, silicon nitride, or silicon oxynitride layer, with a thickness of at least 15 nm, wherein the carbon content of the barrier layer is <15%.

Abstract: A process for coating plastic substrates with a transparent layer compact that is not sensitive to scratches and abrasion and resistant to atmospheric influence with a plasma flame in a vacuum chamber at some distance from the substrate. The process includes the steps of: a cleaning of the substrate with an oxidizing gas in a first procedural step and then a cross linkage with an inert gas in a second procedural step, an oxidizing gas and a silicon-organic compound are used in a third procedural step to produce a first barrier layer, and an oxidizing gas, a silicon-organic compound, and a UV-absorbing compound are used in a fourth procedural step to deposit a sublayer with UV absorbers, an oxidizing gas and a silicon-organic compound are used in a fifth procedural step to deposit a scratch-resistant layer, an inert gas and a silicon-organic compound are used in a sixth procedural step to deposit a smooth layer.

Abstract: In a method for the coating of substrates made of plastic, with a light-reflecting layer, preferably an aluminum layer, and another layer placed between the substrate and the light-reflecting layer, the additional layer, which has a high barrier effect to substances which migrate or evolve gases from the plastic, is a highly crosslinked hydrocarbon layer, a silicon dioxide, silicon nitride, or silicon oxynitride layer, with a thickness of at least 15 nm, wherein the carbon content of the barrier layer is <15%.

Abstract: A process and device is shown for coating the delineating surfaces of a hollow object, preferably a hollow object having at least one sealable opening, by means of plasma coating, via the action of plasma on the delineating surface of the hollow object that is to be coated.

Abstract: A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material c