Patents by Inventor Wilhelm Knobloch

Wilhelm Knobloch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHARMACEUTICAL FORMULATION
    Publication number: 20230390302
    Abstract: The present invention relates to a pharmaceutical composition of 8-chloro-5-methyl-1-[4-(2-pyridyloxy)cyclohexyl]-4,6-dihydro-[1,2,4]triazolo[4,3-a][1,4]benzodiazepine, a process for the preparation thereof and its use in the treatment of diseases.
    Type: Application
    Filed: April 4, 2023
    Publication date: December 7, 2023
    Applicant: Hoffmann-La Roche Inc.
    Inventors: Patrick BUSSON, Georg HUMMEL, Thomas Peter Wilhelm KNOBLOCH
  • PHARMACEUTICAL FORMULATION
    Publication number: 20200297732
    Abstract: The present invention relates to a pharmaceutical composition of 8-chloro-5-methyl-1-[4-(2-pyridyloxy)cyclohexyl]-4,6-dihydro-[1,2,4]triazolo[4,3-a][1,4]benzodiazepine, a process for the preparation thereof and its use in the treatment of diseases.
    Type: Application
    Filed: June 5, 2020
    Publication date: September 24, 2020
    Applicant: Hoffmann-La Roche Inc.
    Inventors: Patrick Jean-Marie BUSSON, Georg HUMMEL, Thomas Peter Wilhelm KNOBLOCH
  • Tetra (hydroxphenyl) alkanes
    Patent number: 5554797
    Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy,--OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl,--C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: September 10, 1996
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Reinhard Schulz, Norbert M unzel, Martin Roth, Wilhelm Knobloch
  • Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes
    Patent number: 5436098
    Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers, are eminently suitable for making relief structures.
    Type: Grant
    Filed: January 11, 1994
    Date of Patent: July 25, 1995
    Assignee: Ciba-Geigy Corporation
    Inventors: Reinhard Schulz, Norbert Munzel, Martin Roth, Wilhelm Knobloch
  • Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive
    Patent number: 5296330
    Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.
    Type: Grant
    Filed: August 15, 1992
    Date of Patent: March 22, 1994
    Assignees: Ciba-Geigy Corp., OCG Microelectronics Inc.
    Inventors: Reinhard Schulz, Norbert Munzel, Martin Roth, Wilhelm Knobloch