Patents by Inventor Wilhelmus Corbeij

Wilhelmus Corbeij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic system, sensor, and method of measuring properties of a substrate
    Publication number: 20070182964
    Abstract: A sensor measuring properties of a substrate in which radiation is projected onto the substrate by a radiation projector that has a first part configured such that the radiation projection can project onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector can project onto the substrate linearly polarized radiation oriented in a second direction orthogonal to the first direction.
    Type: Application
    Filed: February 9, 2006
    Publication date: August 9, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Den Boef, Wilhelmus Corbeij, Mircea Dusa, Reinder Plug
  • Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
    Publication number: 20070013921
    Abstract: A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation reflected and/or diffracted by the structure.
    Type: Application
    Filed: June 30, 2006
    Publication date: January 18, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Petrus Pellemans, Arie Den Boef, Wilhelmus Corbeij, Hans Laan
  • Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method
    Publication number: 20070002336
    Abstract: A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation reflected and/or diffracted by the structure.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henricus Petrus Pellemans, Arie Den Boef, Wilhelmus Corbeij