Patents by Inventor Wilhelmus Franciscus Johanne SIMONS
Wilhelmus Franciscus Johanne SIMONS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140098353Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: December 13, 2013Publication date: April 10, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Michel RIEPEN, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8681308Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.Type: GrantFiled: September 13, 2007Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8634053Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: November 30, 2007Date of Patent: January 21, 2014Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8472003Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.Type: GrantFiled: June 22, 2010Date of Patent: June 25, 2013Assignee: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
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Publication number: 20130149649Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: ApplicationFiled: December 4, 2012Publication date: June 13, 2013Applicant: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus POLET, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Patent number: 8452442Abstract: A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal, selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal, generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus.Type: GrantFiled: February 8, 2012Date of Patent: May 28, 2013Assignee: ASML Netherlands B.V.Inventors: Marcel François Heertjes, Wilhelmus Franciscus Johannes Simons, Dennis Andreas Petrus Hubertina Houben, Jeffrey Hendrikus Peter Maria Goossens
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Patent number: 8259283Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: GrantFiled: March 20, 2009Date of Patent: September 4, 2012Assignee: ASML Netherlands B.V.Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
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Publication number: 20120143367Abstract: A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal, selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal, generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus.Type: ApplicationFiled: February 8, 2012Publication date: June 7, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Francois HEERTJES, Wilhelmus Franciscus Johanne SIMONS, Dennis, Andreas Petrus Hubertina HOUBEN, Jeffrey Hendrikus Peter Maria GOOSSENS
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Patent number: 8135488Abstract: A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal, selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal, generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus.Type: GrantFiled: December 10, 2008Date of Patent: March 13, 2012Assignee: ASML Netherlands B.V.Inventors: Marcel François Heertjes, Wilhelmus Franciscus Johannes Simons, Dennis Andreas Petrus Hubertina Houben, Jeffrey Hendrikus Peter Maria Goossens
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Publication number: 20120019801Abstract: A position control system to control the position of a movable object, including a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal on the basis of a comparison of the actual position related quantity and the position related set-point signal, a controller to provide a control signal on the basis of the error signal, a feed-forward device to provide a feed-forward signal on the basis of the position related set-point signal, and one or more actuators to act on the movable object on the basis of the control signal and the feed-forward signal, wherein the feed-forward device includes a disturbance force correction table including estimations of disturbance forces exerted on the movable object in dependence of a position of the movable object.Type: ApplicationFiled: June 27, 2011Publication date: January 26, 2012Applicant: ASWL Netherlands B.V.Inventors: Wilhelmus Franciscus Johannes SIMONS, Norbertus Josephus Martinus Van Den Nieuwelaar, Marcel Françoi Heertjes, Joost Jozef Hendrik Gielis, Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks
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Patent number: 7948609Abstract: In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage.Type: GrantFiled: December 17, 2008Date of Patent: May 24, 2011Assignee: ASML Netherlands B.V.Inventors: Mauritius Gerardus Elisabeth Schneiders, Wilhelmus Franciscus Johannes Simons
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Publication number: 20110005603Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.Type: ApplicationFiled: June 22, 2010Publication date: January 13, 2011Applicant: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
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Patent number: 7710540Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.Type: GrantFiled: April 5, 2007Date of Patent: May 4, 2010Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Henrikus Herman Marie Cox, Jeroen Johannes Sophia Maria Mertens, Wilhelmus Franciscus Johannes Simons, Paul Petrus Joannes Berkvens
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Patent number: 7630059Abstract: A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.Type: GrantFiled: July 24, 2006Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes, Wilhelmus Franciscus Johannes Simons
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Publication number: 20090244767Abstract: A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal, selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal, generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus.Type: ApplicationFiled: December 10, 2008Publication date: October 1, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Francois Heertjes, Wilhelmus Franciscus Johannes Simons, Dennis Andreas Petrus Hubertina, Houben, Jeffrey Hendrikus Peter Maria Goossens
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Publication number: 20090237632Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: ApplicationFiled: March 20, 2009Publication date: September 24, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
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Publication number: 20090231566Abstract: In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage.Type: ApplicationFiled: December 17, 2008Publication date: September 17, 2009Applicant: ASML Netherlands B.V.Inventors: Mauritius Gerardus Elisabeth SCHNEIDERS, Wilhelmus Franciscus Johannes Simons
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Patent number: 7561250Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.Type: GrantFiled: June 19, 2007Date of Patent: July 14, 2009Assignee: ASML Netherlands B.V.Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
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Publication number: 20080316441Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.Type: ApplicationFiled: June 19, 2007Publication date: December 25, 2008Applicant: ASML NETHERLAND B.V.Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
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Publication number: 20080246936Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.Type: ApplicationFiled: April 5, 2007Publication date: October 9, 2008Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Henrikus Herman Marie Cox, Jeroen Johannes Sophia Maria Mertens, Wilhelmus Franciscus Johannes Simons, Paul Petrus Joannes Berkvens