Patents by Inventor Wilhelmus Jacobus Maria Rooijakkers
Wilhelmus Jacobus Maria Rooijakkers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10401734Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates while substantially conserving the polaType: GrantFiled: July 25, 2016Date of Patent: September 3, 2019Assignee: ASML Netherlands B.V.Inventors: Robbert Jan Voogd, Wilhelmus Jacobus Maria Rooijakkers
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Publication number: 20180224751Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polType: ApplicationFiled: July 25, 2016Publication date: August 9, 2018Applicant: ASML Netherlands B.V.Inventors: Robbert Jan VOOGD, Wilhelmus Jacobus Maria ROOIJAKKERS
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Patent number: 9170498Abstract: A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.Type: GrantFiled: March 5, 2013Date of Patent: October 27, 2015Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel François Hubert Klaassen, Martijn Gerard Dominique Wehrens, Haico Victor Kok, Wilhelmus Jacobus Maria Rooijakkers, Tammo Uitterdijk
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Patent number: 8760625Abstract: An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.Type: GrantFiled: June 27, 2011Date of Patent: June 24, 2014Assignee: ASML Netherlands B.V.Inventor: Wilhelmus Jacobus Maria Rooijakkers
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Patent number: 8269186Abstract: A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.Type: GrantFiled: December 20, 2011Date of Patent: September 18, 2012Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Jacobus Maria Rooijakkers, Martijn Gerard Dominique Wehrens
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Publication number: 20120091357Abstract: A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.Type: ApplicationFiled: December 20, 2011Publication date: April 19, 2012Applicant: ASML Netherlands B.V.Inventors: Wilhelmus Jacobus Maria ROOIJAKKERS, Martijn Gerard Dominique Wehrens
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Patent number: 8124939Abstract: A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.Type: GrantFiled: August 19, 2010Date of Patent: February 28, 2012Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Jacobus Maria Rooijakkers, Martijn Gerard Dominique Wehrens
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Publication number: 20120026477Abstract: An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.Type: ApplicationFiled: June 27, 2011Publication date: February 2, 2012Applicant: ASML Neitherlands B.V.Inventor: Wilhelmus Jacobus Maria ROOIJAKKERS
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Publication number: 20110220806Abstract: A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.Type: ApplicationFiled: August 19, 2010Publication date: September 15, 2011Applicant: ASML Netherlands B.V.Inventors: Wilhelmus Jacobus Maria Rooijakkers, Martijn Gerard Dominique Wehrens
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Publication number: 20100182582Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: July 22, 2010Applicant: ASML Netherlands B.V,Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling
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Publication number: 20100118288Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: May 13, 2010Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling
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Publication number: 20100045956Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: February 25, 2010Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling