Abstract: An ultrasound probe positioning system comprises a positioning unit for holding an ultrasound probe unit and for moving the ultrasound probe unit and positioning it at a target position and a positioning control unit configured to provide target positioning data indicative of a target position that establishes a mechanical contact of the ultrasound probe unit with an external object and to control the mechanical positioning unit in moving and positioning the ultrasound probe at the target position. The positioning unit comprises a force actuation unit configured to adapt a pressing force amount of a mechanical pressing force exerted on the object in response to a variation of a counterforce amount so as to maintain a predetermined net pressing force amount exerted by the mechanical pressing force against the counterforce.

Abstract: An ultrasound probe positioning system (100) comprises a positioning unit (102) for holding an ultrasound probe unit (104) and for moving the ultrasound probe unit and positioning it at a target position and a positioning control unit (106) configured to provide target positioning data indicative of a target position that establishes a mechanical contact of the ultrasound probe unit with an external object (110) and to control the mechanical positioning unit in moving and positioning the ultrasound probe at the target position. The positioning unit comprises a force actuation unit (108) configured to adapt a pressing force amount of a mechanical pressing force exerted on the object in response to a variation of a counterforce amount so as to maintain a predetermined net pressing force amount exerted by the mechanical pressing force against the counterforce.

Abstract: An ultrasound probe positioning system (100) comprises a positioning unit (102) for holding an ultrasound probe unit (104) and for moving the ultrasound probe unit and positioning it at a target position and a positioning control unit (106) configured to provide target positioning data indicative of a target position that establishes a mechanical contact of the ultrasound probe unit with an external object (110) and to control the mechanical positioning unit in moving and positioning the ultrasound probe at the target position. The positioning unit comprises a force actuation unit (108) configured to adapt a pressing force amount of a mechanical pressing force exerted on the object in response to a variation of a counterforce amount so as to maintain a predetermined net pressing force amount exerted by the mechanical pressing force against the counterforce.

Abstract: A geo-fencing system (102) includes a base device (104) configured to create a virtual fence (108) around the base devise that bounds a safe zone (110). The geo-fencing system further includes a wearable device (106) initially located within the safe zone. The geo-fencing system further includes a processor configured to execute a dynamic adaptive control algorithm that computes at least one operating parameter for at least one of the base device and the wearable device based on a dynamic and adaptive combination of different signals indicative of distance measurements between the wearable device and the base device computed by the at least one of the base device and the wearable device. The processor conveys the at least one operating parameter to the at least one of the base device and the wearable device, which employs the at least one operating parameter for operation and determination of subsequent distance measurements.

Abstract: A geo-fencing system (102) includes a base device (104) configured to create a virtual fence (108) around the base devise that bounds a safe zone (110). The geo-fencing system further includes a wearable device (106) initially located within the safe zone. The geo-fencing system further includes a processor configured to execute a dynamic adaptive control algorithm that computes at least one operating parameter for at least one of the base device and the wearable device based on a dynamic and adaptive combination of different signals indicative of distance measurements between the wearable device and the base device computed by the at least one of the base device and the wearable device. The processor conveys the at least one operating parameter to the at least one of the base device and the wearable device, which employs the at least one operating parameter for operation and determination of subsequent distance measurements.

Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Abstract: Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

Abstract: A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

Abstract: A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract: A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.