Patents by Inventor Wilhelmus P. M. Nijssen

Wilhelmus P. M. Nijssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a semiconductor device, in which a negative image is formed on a semiconductor substrate in a positive photolacquer
    Patent number: 4937176
    Abstract: A method of manufacturing a semiconductor device, in which a layer of photolacquer (5) containing as a photoactive component a diazo oxide is provided on a semiconductor substrate. Of this layer, parts (9) are irradiated by a first patterned irradiation (7) and these parts are then rendered poorly developable by an intermediate treatment. Subsequently, the lacquer layer (5) is subjected to a second non-patterned irradiation (11) and is then developed. According to the invention, in the parts (9) irradiated by the first irradiation a pigment is formed, which absorbs radiation having a wavelength at which diazo oxide is photosensitive. The second irradiation is carried out with radiation of that wavelength. Thus, lacquer tracks having a rectangular profile can be obtained in a simple manner.
    Type: Grant
    Filed: September 27, 1988
    Date of Patent: June 26, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus A. Vollenbroek, Wilhelmus P. M. Nijssen, Marcellinus J. H. J. Geomini
  • Method of manufacturing a semiconductor device, in which a photolacquer mask is formed by means of a two-layer lacquer system.
    Patent number: 4704347
    Abstract: A method of manufacturing a semiconductor device, in which there is applied to a surface of a semiconductor substrate a base layer of photosensitive lacquer, which is coated with a top layer of photosensitive lacquer. By means of a first patterned irradiation, there is formed in the top layer a mask of which a contact copy is formed in the base layer during a second irradiation. A material which can be discolored is used for the top layer. During the first irradiation, the top layer is locally discolored, whereupon the layer thus discolored is used as a mask during the second irradiation. By the use of the discoloring top layer, additional processing steps, which would ensure from a wet development of the top layer, are avoided.
    Type: Grant
    Filed: January 29, 1986
    Date of Patent: November 3, 1987
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus A. Vollenbroek, Jan G. Dil, Henricus J. J. Kroon, Elisabeth J. Spiertz, Wilhelmus P. M. Nijssen
  • Recording element having a pyrylium or thiopyrylium-squarylium dye layer and new pyrylium or thiopyrylium-squarylium compounds
    Patent number: 4508811
    Abstract: An optical recording element having a recording layer which comprises an alkylpyrylium-squarylium dye, as well as novel alkylpyrylium-squarylium compounds.
    Type: Grant
    Filed: October 31, 1983
    Date of Patent: April 2, 1985
    Assignee: U.S. Philips Corporation
    Inventors: Dirk J. Gravesteijn, Christiaan Steenbergen, Jan Van der Veen, Wilhelmus P. M. Nijssen
  • Dye-containing layer of a film-forming polymeric binder and the use thereof in an information recording element
    Patent number: 4364986
    Abstract: Dye-containing layer of a film-forming polymeric binder and the application thereof in an information recording element.The invention relates to a dye-containing layer in which dye, if desired in a very large weight percentage is dissolved or finely divided in a copolymer (1:1) of methyl vinyl ether and maleic anhydride or a semi-ester thereof.The dye-containing layer is particularly suitable for use as a recording layer in an optical information recording element.
    Type: Grant
    Filed: October 6, 1980
    Date of Patent: December 21, 1982
    Assignee: U.S. Philips Corporation
    Inventors: Dirk J. Zwanenburg, Wilhelmus P. M. Nijssen, Caspert G. I. van der Staak