Patents by Inventor Willem Cornelis Lambert Hopman

Willem Cornelis Lambert Hopman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230241535
    Abstract: A filter for a pulsed laser deposition device includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pass-through channel extends from one side of the housing to an opposite side of the housing, at least one primary blade arranged at a distance from and rotatable around a rotation axis, with the path of the at least one primary blade intersecting with the pass-through channel and with the at least one primary blade having a contact surface for contact with the plasma plume, and a drain channel connecting to a drain opening arranged in the housing wall.
    Type: Application
    Filed: April 11, 2023
    Publication date: August 3, 2023
    Inventors: Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Bohm, Willem Cornelis Lambert Hopman, Jeroen Aaldert Heuver, Jan Arnaud Janssens
  • Patent number: 11655535
    Abstract: The invention relates to a device for pulsed laser deposition and a substrate with a substrate surface, which device includes: a substrate holder for holding the substrate; a target arranged facing the substrate surface of the substrate; a velocity filter arranged between the substrate and the target; a pulsed laser directed onto the target at a target spot for generating a plasma plume of target material; and a plasma hole plate arranged between the target and the substrate. The plasma hole plate has a plasma passage opening divided in an upstream section and a downstream section by a dividing plane. The target spot coincides with the dividing plane, and the surface area of the upstream section is larger than the surface area of the downstream section.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: May 23, 2023
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Jan Arnaud Janssens, Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Böhm, Willem Cornelis Lambert Hopman, Jeroen Aaldert Heuver
  • Patent number: 11628389
    Abstract: The invention relates to a filter for filtering particles from a plasma plume. The filter includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pass-through channel extends from one side of the housing to an opposite side of the housing, at least one primary blade arranged at a distance from and rotatable around a rotation axis, which rotation axis is parallel and spaced apart from the center line of the pass-through channel, with the path of the at least one primary blade intersecting with the pass-through channel and with the at least one primary blade having a contact surface for contact with the plasma plume, which contact surface is facing in the direction of the rotation direction, and a drain channel connecting to a drain opening arranged in the housing wall.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: April 18, 2023
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Böhm, Willem Cornelis Lambert Hopman, Jeroen Aaldert Heuver, Jan Arnaud Janssens
  • Publication number: 20220064782
    Abstract: The invention relates to a method for producing a scandium aluminum nitride (ScAlN) target body for pulsed laser deposition (PLD), which includes the steps of: providing a scandium aluminum alloy body; pulverizing the scandium aluminum alloy body into scandium aluminum particles; nitridizing the scandium aluminum particles into scandium aluminium nitride particles; and hot pressing the scandium aluminum nitride particles into a scandium aluminum nitride target body.
    Type: Application
    Filed: August 25, 2021
    Publication date: March 3, 2022
    Inventors: Willem Cornelis Lambert Hopman, Jan Matthijn Dekkers
  • Publication number: 20210370435
    Abstract: The invention relates to a method for controlling stress in a substrate during laser deposition.
    Type: Application
    Filed: May 27, 2021
    Publication date: December 2, 2021
    Inventors: Kurt Hein Vergeer, Jeroen Aaldert Heuver, Willem Cornelis Lambert Hopman, Kristiaan Hendrikus Aloysius Böhm, Jan Matthijn Dekkers, Jan Arnaud Janssens
  • Publication number: 20210252441
    Abstract: The invention relates to a filter for filtering particles from a plasma plume. The filter includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pass-through channel extends from one side of the housing to an opposite side of the housing, at least one primary blade arranged at a distance from and rotatable around a rotation axis, which rotation axis is parallel and spaced apart from the center line of the pass-through channel, with the path of the at least one primary blade intersecting with the pass-through channel and with the at least one primary blade having a contact surface for contact with the plasma plume, which contact surface is facing in the direction of the rotation direction, and a drain channel connecting to a drain opening arranged in the housing wall.
    Type: Application
    Filed: February 18, 2021
    Publication date: August 19, 2021
    Inventors: Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Böhm, Willem Cornelis Lambert Hopman, Jeroen Aaldert Heuver, Jan Arnaud Janssens
  • Publication number: 20200002805
    Abstract: The invention relates to a device for pulsed laser deposition and a substrate with a substrate surface, which device includes: a substrate holder for holding the substrate; a target arranged facing the substrate surface of the substrate; a velocity filter arranged between the substrate and the target; a pulsed laser directed onto the target at a target spot for generating a plasma plume of target material; and a plasma hole plate arranged between the target and the substrate. The plasma hole plate has a plasma passage opening divided in an upstream section and a downstream section by a dividing plane. The target spot coincides with the dividing plane, and the surface area of the upstream section is larger than the surface area of the downstream section.
    Type: Application
    Filed: June 25, 2019
    Publication date: January 2, 2020
    Inventors: Jan Arnaud Janssens, Jan Matthijn Dekkers, Kristiaan Hendrikus Aloysius Böhm, Willem Cornelis Lambert Hopman, Jeroen Aaldert Heuver