Patents by Inventor Willem De Jager

Willem De Jager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070109510
    Abstract: A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
    Type: Application
    Filed: December 29, 2006
    Publication date: May 17, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Willem De Jager, Cheng-Qun Gui, Peter Spit, Eduard Hoeberichts
  • Publication number: 20070052943
    Abstract: A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the beam passing through the pupil is adjusted.
    Type: Application
    Filed: November 14, 2006
    Publication date: March 8, 2007
    Applicant: ASML Netherlands B.V.
    Inventor: Pieter Willem De Jager
  • Publication number: 20070046919
    Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
    Type: Application
    Filed: November 6, 2006
    Publication date: March 1, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Cheng-Qun Gui, Arno Bleeker, Pieter Willem De Jager
  • Publication number: 20070026325
    Abstract: A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
    Type: Application
    Filed: July 29, 2005
    Publication date: February 1, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Maria Derksen, Pieter Willem De Jager, Erik Jose Smeets
  • Publication number: 20060215142
    Abstract: A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
    Type: Application
    Filed: March 25, 2005
    Publication date: September 28, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Willem De Jager, Theodorus Van Den Akker, Willem Venema, Wouter Mulckhuyse, Lambertus Gerardus Kessels
  • Publication number: 20050190354
    Abstract: A diffractive optical MEMS device includes a plurality of parallel planar reflective surfaces and an actuator system. The actuator system is used to adjust the position of each of the planar reflectors in a direction perpendicular to the planar reflectors to change characteristics (e.g., phase, intensity, etc.) of light interacting with the device.
    Type: Application
    Filed: February 27, 2004
    Publication date: September 1, 2005
    Inventor: Pieter Willem de Jager
  • Patent number: 5113146
    Abstract: An amplifier arrangement includes a transistor differential pair (N1, N2) having an input terminal (3) and an output terminal (4). The transistor differential pair is coupled to a current mirror (P1, P2). A first level shifting circuit (6) and a second level shifting circuit (7) stabilize the d.c. voltage levels on the mutually coupled main electrodes of the differential pair (N1, N2) and the current mirror (P1, P2) respectively. Consequently, the influence of the Early-effect on the differential pair is suppressed and an improved linear signal transmission is obtained from the input terminal (3) to the output terminal (4). The level shifting circuit (6) also provides a base current compensation in order to produce a high input impedance and the second level shifting circuit (7) provides a base current compensation for equal adjusting currents through the differential pair to reduce any offset voltage.
    Type: Grant
    Filed: March 12, 1991
    Date of Patent: May 12, 1992
    Assignee: U.S. Philips Corp.
    Inventors: Willem de Jager, Eetze A. de Boer
  • Patent number: 4961046
    Abstract: By compensating for the base-emitter voltage of the transistor T.sub.1 by means of the base-emitter voltage of the transistor T.sub.4 the voltage U.sub.z across the impedance Z is made equal to the input voltage U.sub.i. The current I.sub.z through the impedance Z and the equal output current I.sub.O are then proportional to the input voltage U.sub.i and are highly linear.
    Type: Grant
    Filed: August 11, 1989
    Date of Patent: October 2, 1990
    Assignee: U.S. Philips Corp.
    Inventor: Willem De Jager
  • Patent number: 4951003
    Abstract: A amplifier circuit comprises first transistor (T.sub.1) and a second transistor (T.sub.2) whose emitters are each connected via a first resistors (R.sub.1) to a point (2) which is connected to the power-supply terminal (3) by means of a current source (1). The bases of said transistors are connected to input terminals (4,5) and via a second resistor (R.sub.2) each to the base of a third transistor (T.sub.3) whose emitter is connected to the terminal (2). The linearity of the circuit is improved by arranging a fourth transistor (T.sub.4) and a fifth transistor (T.sub.5) in series with the collector-emitter paths of the first transistor (T.sub.1) and the second transistor (T.sub.2) which fourth and fifth transistor have their bases connected to a reference terminal (7) and have their emitters interconnected by means of a third resistor (R.sub.3).
    Type: Grant
    Filed: May 16, 1989
    Date of Patent: August 21, 1990
    Assignee: U.S. Philips Corp.
    Inventors: Willem De Jager, Evert Seevinck
  • Patent number: 4857861
    Abstract: The first (T.sub.1) and the second (T.sub.2) output transistor of an amplifier arrangement are push-pull driven by means of a drive circuit (10) having two transistors (T.sub.11, T.sub.12) which are each loaded by a current source (T.sub.13, T.sub.14). Currents which are a measure of the currents flowing through the first (T.sub.1) and the second (T.sub.2) output transistor are generated by first (20) and second (30) current measuring means. These currents are applied to a control circuit (40) which controls the current intensity of the current sources (T.sub.13, T.sub.14) in such a way that the harmonic mean value of the currents flowing through the first (T.sub.1) and the second (T.sub.2) output transistor is substantially equal to a reference value.
    Type: Grant
    Filed: March 2, 1988
    Date of Patent: August 15, 1989
    Assignee: U. S. Philips Corporation
    Inventors: Evert Seevinck, Willem De Jager, Buitendijk
  • Patent number: 4853645
    Abstract: The first (T.sub.1) and the second (T.sub.2) output transistor of an amplifier arrangement are push-pull driven by means of a drive circuit (10) having two transistors (T.sub.11, T.sub.12) which are each loaded by a current source (T.sub.13, T.sub.14). Currents which are a measure of the currents flowing through the first (T.sub.1) and the second (T.sub.2) output transistor are generated by first (20) and second (30) current measuring means. These currents are applied to a negative feedback means (40) which controls the current intensity of the current sources (T.sub.13, T.sub.14) in such a way that the harmonic mean value of the currents flowing through the first (T.sub.1) and the second (T.sub.2) output transistor is substantially equal to a reference value.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: August 1, 1989
    Assignee: U.S. Philips Corporation
    Inventors: Evert Seevinck, Willem De Jager, Pieter Buitendijk