Patents by Inventor Willem Jan Grootjans

Willem Jan Grootjans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9760018
    Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: September 12, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Seyed Iman Mossavat, Hugo Augustinus Joseph Cramer, Willem Jan Grootjans, Adriaan Johan Van Leest
  • Patent number: 9518936
    Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: December 13, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Jan Grootjans, Henricus Johannes Lambertus Megens, Jouke Krist, Miguel Garcia Granda, Lu Xu
  • Publication number: 20160154319
    Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.
    Type: Application
    Filed: August 5, 2014
    Publication date: June 2, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Seyed Iman MOSSAVAT, Hugo Augustinus Joseph CRAMER, Willem Jan GROOTJANS, Adriaan Johan VAN LEEST
  • Publication number: 20150308966
    Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions.
    Type: Application
    Filed: October 30, 2013
    Publication date: October 29, 2015
    Applicant: ASML Nertherlands B.V
    Inventors: Willem Jan GROOTJANS, Henricus Johannes Lambertu MEGENS, Jouke KRIST, Miguel GARCIA GRANDA, Lu XU
  • Patent number: 8868387
    Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Jouke Krist, Willem Jan Grootjans
  • Publication number: 20090094005
    Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
    Type: Application
    Filed: October 8, 2008
    Publication date: April 9, 2009
    Applicant: ASML Netherlands B. V.
    Inventors: Arie Jeffrey DEN BOEF, Hugo Augustinus Joseph Cramer, Jouke Krist, Willem Jan Grootjans