Patents by Inventor Willem Jurrianus Venema
Willem Jurrianus Venema has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9958788Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: January 12, 2017Date of Patent: May 1, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
Patent number: 9658541Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.Type: GrantFiled: July 2, 2014Date of Patent: May 23, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van De Kerkhof, Willem Jurrianus Venema, Bearrach Moest, Vasco Miguel Matias Serrao, Cedran Bomhof -
Publication number: 20170123323Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: January 12, 2017Publication date: May 4, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy PROSYENTSOV, Willem Jurrianus VENEMA, Kars Zeger TROOST, Adrianus Martinus VAN DER WIELEN
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Patent number: 9568833Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: October 10, 2014Date of Patent: February 14, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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Patent number: 9417533Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: November 29, 2011Date of Patent: August 16, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van der Wielen
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Publication number: 20150029481Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: October 10, 2014Publication date: January 29, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy PROSYENTSOV, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE
Publication number: 20140313500Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.Type: ApplicationFiled: July 2, 2014Publication date: October 23, 2014Inventors: Marcus Adrianus VAN DE KERKHOF, Willem Jurrianus VENEMA, Bearrach MOEST, Vasco Miguel Miguel MATIAS SERRAO, Cedran BOMHOF -
Patent number: 8773637Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.Type: GrantFiled: October 20, 2010Date of Patent: July 8, 2014Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Willem Jurrianus Venema, Bearrach Moest, Vasco Miguel Matias Serrao, Cedran Bomhof
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Patent number: 8675210Abstract: A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.Type: GrantFiled: September 4, 2012Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Jozef Petrus Henricus Benschop, Ralph Brinkhof, Willem Jurrianus Venema, Lukasz Jerzy Macht, Laurent Khuat Duy, Dimitra Sarri
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Publication number: 20130077079Abstract: A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.Type: ApplicationFiled: September 4, 2012Publication date: March 28, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey DEN BOEF, Jozef Petrus Henricus Benschop, Ralph Brinkhof, Willem Jurrianus Venema, Lukasz Jerzy Macht, Laurent Khuat Duy, Dimitra Sarri
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Patent number: 8279396Abstract: An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface.Type: GrantFiled: December 1, 2008Date of Patent: October 2, 2012Assignee: ASML Netherlands B.V.Inventors: Nicolaas Ten Kate, Willem Jurrianus Venema, Ronald Van Der Ham
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Publication number: 20120133914Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: November 29, 2011Publication date: May 31, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van der Wielen
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LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE
Publication number: 20110090476Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.Type: ApplicationFiled: October 20, 2010Publication date: April 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Willem Jurrianus Venema, Bearrach Moest, Vasco Miguel Matias Serrao, Cedran Bomhof -
Patent number: 7830493Abstract: A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.Type: GrantFiled: October 25, 2005Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Willem Jurrianus Venema, Koen Jacobus Johannes Maria Zaal
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Patent number: 7671319Abstract: An energy sensor comprises a radiation-sensitive detector, a circuit, and an analog-to-digital converter. The radiation-sensitive detector is arranged to receive a pulsed radiation beam and to generate a current in response thereto. The circuit is equivalent to an RC network and is electrically connected across the radiation-sensitive detector. The analog-to-digital converter is electrically connected across a resistive component of the circuit and is arranged to output digital samples measuring the voltage across the resistive component at a sampling rate that is greater than the pulse repetition rate of the pulsed radiation beam. The energy sensor may be provided as part of a transmission image sensor.Type: GrantFiled: February 28, 2007Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventor: Willem Jurrianus Venema
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Publication number: 20090290139Abstract: A sensor for measuring a patterned beam of radiation in a lithographic exposure apparatus includes a receiving part for receiving the patterned beam of radiation and a processing part arranged to receive at least a part of the patterned radiation beam via the receiving part. The receiving part of the sensor is integrated in a substrate table for holding a substrate.Type: ApplicationFiled: May 21, 2009Publication date: November 26, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Arie Johan VAN DER SIJS, Willem Jurrianus Venema
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Patent number: 7595496Abstract: A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.Type: GrantFiled: June 21, 2007Date of Patent: September 29, 2009Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Harmen Klaas Van Der Schoot, Jeroen Pieter Starreveld, Wouterus Johannes Petrus Maria Maas, Willem Jurrianus Venema, Boris Menchtchikov
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Publication number: 20090168032Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Willem Jurrianus Venema, Ronald Van Der Ham
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Patent number: 7528933Abstract: An array of individually controllable elements for a lithographic apparatus comprise reflectors that can be actuated by an actuator and are biased to return to a given position by a force that varies non-linearly with the displacement of the reflector from that position.Type: GrantFiled: April 6, 2006Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventor: Willem Jurrianus Venema
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Patent number: 7477772Abstract: A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation.Type: GrantFiled: May 31, 2005Date of Patent: January 13, 2009Assignee: ASML Netherlands B.V.Inventors: Andrej Makarovic, Willem Jurrianus Venema, Lambertus Gerardus Maria Kessels, Marcel Bontekoe