Patents by Inventor Willem, Michiel De Rapper

Willem, Michiel De Rapper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cooling apparatus and plasma-cleaning station for cooling apparatus
    Patent number: 11287752
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: March 29, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Cornelis Adrianus De Meijere, Willem Michiel De Rapper, Sjoerd Nicolaas Lambertus Donders, Jan Groenewold, Alain Louis Claude Leroux, Maxim Aleksandrovich Nasalevich, Andrey Nikipelov, Johannes Adrianus Cornelis Maria Pijnenburg, Jacobus Cornelis Gerardus Van Der Sanden
  • Cooling apparatus and plasma-cleaning station for cooling apparatus
    Patent number: 11231657
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: January 25, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Cornelis Adrianus De Meijere, Willem Michiel De Rapper, Sjoerd Nicolaas Lambertus Donders, Jan Groenewold, Alain Louis Claude Leroux, Maxim Aleksandrovich Nasalevich, Andrey Nikipelov, Johannes Adrianus Cornelis Maria Pijnenburg, Jacobus Cornelis Gerardus Van Der Sanden
  • Method and device for determining the heating state of a mirror in an optical system
    Patent number: 11156922
    Abstract: The disclosure provides a method and to an apparatus for determining the heating state of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. A method for determining the heating state of an optical element includes: measuring values of a first temperature that the optical element has at a first position using a temperature sensor; and estimating a second temperature that the optical element has at a second position, which is located at a distance from the first position, on the basis of the measured values, wherein estimating the second temperature is accomplished while taking into account a temporal change in the previously measured values.
    Type: Grant
    Filed: October 27, 2020
    Date of Patent: October 26, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Willem Michiel De Rapper, Toralf Gruner
  • METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF A MIRROR IN AN OPTICAL SYSTEM
    Publication number: 20210041790
    Abstract: The disclosure provides a method and to an apparatus for determining the heating state of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. A method for determining the heating state of an optical element includes: measuring values of a first temperature that the optical element has at a first position using a temperature sensor; and estimating a second temperature that the optical element has at a second position, which is located at a distance from the first position, on the basis of the measured values, wherein estimating the second temperature is accomplished while taking into account a temporal change in the previously measured values.
    Type: Application
    Filed: October 27, 2020
    Publication date: February 11, 2021
    Inventors: Willem Michiel De Rapper, Toralf Gruner
  • COOLING APPARATUS AND PLASMA-CLEANING STATION FOR COOLING APPARATUS
    Publication number: 20200233319
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
    Type: Application
    Filed: June 7, 2018
    Publication date: July 23, 2020
    Inventors: Adrianus, Hendrik Koevoets, Cornelis, Adrianus De Meijere, Willem, Michiel De Rapper, Sjoerd, Nicolaas, Lambertus Donders, Jan Groenewold, Alain, Louis, Claude Leroux, Maxim, Aleksandrovich Nasalevich, Andrey Nikipelov, Johannes, Adrianus, Cornelis, Maria Pijnenburg, Jacobus, Cornelis, Gerardus Van Der Sanden