Patents by Inventor Willi Neff
Willi Neff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8519368Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.Type: GrantFiled: July 21, 2009Date of Patent: August 27, 2013Assignee: Koninklijke Philips N.V.Inventors: Jakob Willi Neff, Dominik Marcel Vaudrevange, Peter Zink
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Patent number: 8227777Abstract: The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, which electrodes are electrically connected to a power supply (18) and, upon ignition of a first gas discharge (22) between the electrodes (14, 16), transmit an electrical current (I), as a result of which a plasma (24) is produced in a working gas (26), which plasma emits radiation (28), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle (30) into a chamber (32) outside the electrodes (14, 16). In order to prevent erosion at the electrodes (14, 16), it is proposed that the formation of a secondary plasma (34) in the chamber (32) is suppressed by a device (42).Type: GrantFiled: November 29, 2005Date of Patent: July 24, 2012Assignee: Koninklijke Philips Electronics N.V.Inventors: Michael Loeken, Jakob Willi Neff, Juergen Klein, Sven Probst
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Patent number: 8227779Abstract: The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body (110) comprises a rotatably mounted electrode disk (100). The source further comprises a rotary drive (130) for the electrode disk, a device for applying a liquid film of a target material (140) onto a radial outer surface of the electrode disk (100), and a laser that is focussed, within a discharge area (240), onto the radial outer surface of the electrode disk (100) to evaporate target material. The source is characterized by an intermediate space (160) is formed between the electrode bodies, which intermediate space has a reduced width of <5 mm outside the discharge area (240), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.Type: GrantFiled: December 16, 2008Date of Patent: July 24, 2012Assignee: Koninklijke Philips Electronics N.V.Inventor: Jakob Willi Neff
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Publication number: 20110248192Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.Type: ApplicationFiled: December 9, 2009Publication date: October 13, 2011Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Jeroen Jonkers, Felix Alexander Krepper, Harald Ernest Verbraak, Jakob Willi Neff
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Publication number: 20110127442Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.Type: ApplicationFiled: July 21, 2009Publication date: June 2, 2011Applicant: Koninklijke Philips Electronics N.V.Inventors: Jakob Willi Neff, Dominik Marcel Vaudrevange, Peter Zink
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Patent number: 7897948Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.Type: GrantFiled: August 29, 2007Date of Patent: March 1, 2011Assignee: Koninklijke Philips Electronics N.V.Inventors: Jeroen Jonkers, Jakob Willi Neff, Ralf Pruemmer
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Publication number: 20100264336Abstract: The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body (110) comprises a rotatably mounted electrode disk (100). The source further comprises a rotary drive (130) for the electrode disk, a device for applying a liquid film of a target material (140) onto a radial outer surface of the electrode disk (100), and a laser that is focussed, within a discharge area (240), onto the radial outer surface of the electrode disk (100) to evaporate target material. The source is characterized by an intermediate space (160) is formed between the electrode bodies, which intermediate space has a reduced width of <5 mm outside the discharge area (240), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.Type: ApplicationFiled: December 16, 2008Publication date: October 21, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventor: Jakob Willi Neff
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Patent number: 7809112Abstract: A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).Type: GrantFiled: December 13, 2004Date of Patent: October 5, 2010Assignee: Koninklijke Philips Electronics N.V.Inventors: Günther Hans Derra, Rolf Theo Anton Apetz, Willi Neff, Oliver Rosier, Peter Zink
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Publication number: 20100194313Abstract: The present invention relates to a high voltage electrical connection line (11), in particular for electrically connecting a gas discharge source (10) to a high voltage power source (9). The connection line is formed of a stack of two electrically conductive plates (2) separated by an electrically isolating layer (1). An electrically conductive layer (8) of a material having a higher electrical resistivity than the material of the conductive plates (2) is arranged between said isolating layer (1) and said conductive plates (2). The proposed connection line provides a higher life time when used for connecting a high voltage power source and a pulsed discharge lamp.Type: ApplicationFiled: September 25, 2008Publication date: August 5, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Dominik Marcel Vaudrevange, Jakob Willi Neff, Christof Metzmacher
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Patent number: 7734014Abstract: A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.Type: GrantFiled: July 29, 2004Date of Patent: June 8, 2010Assignee: Koninklijke Philips Electronics N.V.Inventors: Klaus Bergmann, Willi Neff
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Patent number: 7630475Abstract: A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.Type: GrantFiled: May 8, 2006Date of Patent: December 8, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Jakob Willi Neff, Ralf Pruemmer
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Publication number: 20090250638Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.Type: ApplicationFiled: August 29, 2007Publication date: October 8, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Jeroen Jonkers, Jacob Willi Neff, Ralf Pruemmer
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Publication number: 20090173896Abstract: The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, which electrodes are electrically connected to a power supply (18) and, upon ignition of a first gas discharge (22) between the electrodes (14, 16), transmit an electrical current (1), as a result of which a plasma (24) is produced in a working gas (26), which plasma emits radiation (28), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle (30) into a chamber (32) outside the electrodes (14, 16). In order to prevent erosion at the electrodes (14, 16), it is proposed that the formation of a secondary plasma (34) in the chamber (32) is suppressed by a device (42).Type: ApplicationFiled: November 29, 2005Publication date: July 9, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Michael Loeken, Jakob Willi Neff, Juergen Klen, Sven Probst
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Patent number: 7518300Abstract: The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).Type: GrantFiled: March 5, 2004Date of Patent: April 14, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Eric Gerardus Theodoor Bosch, Jeroen Jonkers, Willi Neff, Günther Hans Derra
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Publication number: 20080298552Abstract: A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).Type: ApplicationFiled: December 13, 2004Publication date: December 4, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONIC, N.V.Inventors: Gunther Hans Derra, Rolf Theo Anton Apetz, Willi Neff, Oliver Rosier, Peter Zink
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Patent number: 7427766Abstract: A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).Type: GrantFiled: September 1, 2004Date of Patent: September 23, 2008Assignee: Koninklijke Philips Electronics N.V.Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange, Willi Neff
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Publication number: 20080187105Abstract: The present invention relates to a gas discharge source, in particular for EUV radiation and/or soft X-ray radiation, in which, in a vacuum chamber, at least two electrodes with an at least approximately circular periphery are rotatably mounted for rotation, wherein the electrodes at one spatial position have a small spacing for the ignition of a gas discharge and are in each case connected to a reservoir for a liquid, electrically conductive material in such a way that, during rotation, a liquid film of the electrically conductive material can form over the circular periphery of the electrodes and a flow of current to the electrodes is made possible via the reservoirs.Type: ApplicationFiled: May 8, 2006Publication date: August 7, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Jakob Willi Neff, Ralf Pruemmer
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Patent number: 7397190Abstract: The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3?) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5?) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).Type: GrantFiled: November 28, 2003Date of Patent: July 8, 2008Assignee: Koninklijke Philips Electronics, N.V.Inventors: Guenther Hans Derra, Joseph Robert Rene Pankert, Willi Neff, Klaus Bergmann, Jeroen Jonkers
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Publication number: 20080143228Abstract: The invention relates to a gas discharge source, in particular for generating extreme ultraviolet and/or soft X-radiation, in which a gas-filled intermediate electrode space (3) is located between two electrodes (1, 2), in which devices for the admission and evacuation of gas are present, and in which one electrode (1) exhibits an opening (5) that defines an axis of symmetry (4) and is provided for the discharge of radiation. The proposed improvements constitute the presence of a diaphragm (6), which exhibits at least one opening (7) on the axis of symmetry (4) and operates as a differential pump stage, between the two electrodes (1, 2).Type: ApplicationFiled: July 29, 2004Publication date: June 19, 2008Applicant: Koninklijke Philips Electronics N.V.Inventors: Klaus Bergmann, Willi Neff
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Publication number: 20070090304Abstract: A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).Type: ApplicationFiled: September 1, 2004Publication date: April 26, 2007Inventors: Jeroen Jonkers, Dominik Vaudrevange, Willi Neff