Patents by Inventor William A. Ebert
William A. Ebert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240045346Abstract: A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate charge on the reticle stage and to remove particles on the reticle stage via an electrostatic field generated between the conductive layer and the reticle stage. The substrate can include a plurality of grooves and the conductive layer can be disposed on the frontside of the substrate and on a bottom surface of the plurality of grooves. The reticle stage cleaning apparatus can include a second conductive layer configured to remove particles on the reticle stage via a second electrostatic field and be disposed atop the conductive layer in the bottom surface of the plurality of grooves.Type: ApplicationFiled: December 9, 2021Publication date: February 8, 2024Applicant: ASML Netherlands B.V.Inventors: Pedro Julian RIZO DIAGO, George Grigorievich VOEVODKIN, Earl William EBERT
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Publication number: 20230324817Abstract: A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.Type: ApplicationFiled: July 24, 2021Publication date: October 12, 2023Applicant: ASML Holding N.V.Inventors: Earl William EBERT, Roxana REZVANI NARAGHI
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Patent number: 10930446Abstract: Circuit breakers having a cover that includes a medial segment with an aperture for a switch handle. The medial segment merges into a line side segment having at least one channel overlying a lug compartment. The at least one channel has an inner end portion overlying a lug access path to the lug compartment. The circuit breakers also include at least one gas-blocking member coupled to the at least one channel.Type: GrantFiled: February 25, 2020Date of Patent: February 23, 2021Assignee: Eaton Intelligent Power LimitedInventors: William Eberts, Thomas Ted Kuzniarski, Mark Janusek
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Patent number: 9977351Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: July 13, 2017Date of Patent: May 22, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Patent number: 9891540Abstract: A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.Type: GrantFiled: May 29, 2015Date of Patent: February 13, 2018Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Earl William Ebert, Franciscus Godefridus Casper Bijnen
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Patent number: 9868399Abstract: Remote controlled electric mirrors include a main frame, housing horizontal and vertical electrical ram actuators. The body portion of each actuator is pivotally mounted to the main frame. The main frame includes clamp brackets on its lower side, for mounting to support arms extending from a motor vehicle. An elongated swivel member is pivotally mounted to the front of the main frame, for rotation about a horizontal axis. A movable portion of the vertical actuator is pivotally connected to the swivel member. The swivel member includes an upper pin and a lower pin. An upper bracket on the rear of the mirror frame includes an aperture, slip-fitted over the upper pin. An apertured clamp is slip-fitted over the lower pin, and bolted to a lower bracket on the mirror frame. The movable portion of the horizontal actuator is pivotally connected through a heim joint to rear of the mirror frame.Type: GrantFiled: August 15, 2017Date of Patent: January 16, 2018Inventors: William A. Ebert, Adam John Sullivan
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170235230Abstract: A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.Type: ApplicationFiled: May 29, 2015Publication date: August 17, 2017Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Earl William EBERT, Franciscus Godefridus Casper BIJNEN
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Publication number: 20170160652Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: February 21, 2017Publication date: June 8, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9632434Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: GrantFiled: April 29, 2015Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
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Patent number: 9632433Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: October 21, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Patent number: 9187040Abstract: The invention is a vehicular mirror assembly for a rectangular shaped mirror typically found on industrial trucks, earthmovers, and dump trucks. The mirror is placed in a holder with two or more pillow block bearings secured on the back of the holder. A circular rod, creating a first axis, extends longitudinally through the pillow block bearings and is swivelly secured to a mounting bracket thereby forming a second axis. A remotely controlled ram is secured to the mounting bracket and proximate to the edge of the holder allowing operator control of the left/right motion around the second axis; a second remotely controlled ram is swivelly secured to the circular rod for up/down adjustment by the operator for movement of the second axis.Type: GrantFiled: November 30, 2012Date of Patent: November 17, 2015Inventor: William Ebert
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Publication number: 20150301456Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: October 21, 2013Publication date: October 22, 2015Applicants: ASML Holding N.V., ASML Neherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Publication number: 20150241796Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: ApplicationFiled: April 29, 2015Publication date: August 27, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME, Thomas VENTURINO
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Publication number: 20150212432Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.Type: ApplicationFiled: August 26, 2013Publication date: July 30, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Johannes Onvlee, Christopher J. Mason, Earl William Ebert, Peter A. Delmastro
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Publication number: 20150192856Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.Type: ApplicationFiled: March 18, 2015Publication date: July 9, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Johannes Onvlee, Christopher J. Mason, Earl William Ebert, JR., Peter A. Delmastro, Christopher Charles Ward, Thomas Venturino, Geoffrey Alan Schultz, Daniel Nathan Burbank
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Patent number: 8872643Abstract: A safety system for an ore processing facility using a mobile mechanisms such as dozer-type wheeled vehicles operating in proximity with an excavator providing ore to a remote milling site. The excavator or earth moving mechanism has a positioning sensor (such as GPS) generating data indicative of the location of the earth moving mechanism and each of the mobile mechanisms also include positioning sensors. An analysis mechanism receives the positioning sensor data from the earth moving mechanism and the positioning sensor data from said mobile mechanisms and creates a distance calculation which is used alert the alarm in the earth moving mechanism and the alarm in the mobile mechanism if said distance calculation is less than a prescribed value.Type: GrantFiled: April 30, 2013Date of Patent: October 28, 2014Inventor: William Ebert
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Publication number: 20140253891Abstract: A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.Type: ApplicationFiled: May 19, 2014Publication date: September 11, 2014Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Earl William EBERT, JR., Harry SEWELL, Keith William ANDRESEN, Sanjeev Kumar SINGH
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Patent number: RE46212Abstract: Cathode plate edge protector systems formed by secondary and tertiary molding processes, in which fluid plastic is molded around and/or introduced into previously manufactured plastic edge protectors. A U-shaped edge protector system is formed by bevel-cutting abutting ends of edge protector strips, securing the strips in the desired configuration a molding jig, and molding corner pieces around the abutting ends. The system is then removed from the jig and slip-installed over the two sides and the bottom edge of a cathode plate. In an optional tertiary molding process, fluid plastic may be introduced into the remaining void between the edge protector system and the cathode plate. Another edge protector system is formed by mounting edge protector strips on opposing side edges of a cathode plate, damming the open ends, and introducing fluid plastic in the contained voids between the strips and the cathode plate.Type: GrantFiled: August 26, 2014Date of Patent: November 22, 2016Inventor: William A. Ebert