Patents by Inventor William A. Howland
William A. Howland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10316867Abstract: A rotary actuator includes a central housing; an output shaft that extends through the central housing; a vane that is mechanically coupled to the output shaft and divides the central housing into a first chamber and a second chamber; and a flow control mechanism that is moveable within the central housing and including a high pressure port and a low pressure port for communicating hydraulic fluid into and from the first and second chambers. The flow control mechanism is moveable to position the high pressure port and low pressure port relative to the first chamber and the second chamber for communication of the hydraulic fluid, thereby generating a pressure differential across the chambers. The vane rotates within the central housing in response to the pressure differential, and rotation of the vane drives the output shaft. A motor is configured to receive control signals to drive the movement of the flow control mechanism.Type: GrantFiled: March 9, 2017Date of Patent: June 11, 2019Assignee: PARKER-HANNIFIN CORPORATIONInventors: Blake Adam Carl, James William Howland
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Publication number: 20180258963Abstract: A rotary actuator includes a central housing; an output shaft that extends through the central housing; a vane that is mechanically coupled to the output shaft and divides the central housing into a first chamber and a second chamber; and a flow control mechanism that is moveable within the central housing and including a high pressure port and a low pressure port for communicating hydraulic fluid into and from the first and second chambers. The flow control mechanism is moveable to position the high pressure port and low pressure port relative to the first chamber and the second chamber for communication of the hydraulic fluid, thereby generating a pressure differential across the chambers. The vane rotates within the central housing in response to the pressure differential, and rotation of the vane drives the output shaft. A motor is configured to receive control signals to drive the movement of the flow control mechanism.Type: ApplicationFiled: March 9, 2017Publication date: September 13, 2018Inventors: Blake Adam Carl, James William Howland
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Patent number: 8734805Abstract: A method for harvesting algae according to embodiments of the present invention includes filling a reservoir at least partially with a liquid, submerging a bag at least partially in the liquid, the bag containing media, the media comprising algae, the bag comprising a first end, a second end, a harvesting port located closer to the first end than to the second end, and a gas port, delivering gas into the bag through the gas port, and raising the second end of the bag by accumulating the gas at the second end to flow the media toward the harvesting port.Type: GrantFiled: June 23, 2010Date of Patent: May 27, 2014Assignees: Solix Biosystems, Inc., Colorado State University Research FoundationInventors: Peter F. Hentges, Thomas Carroll Barlow, Jeff Tyler Penoyer, David Scott Gorham, Jason Charles Quinn, Peter Allen Letvin, Christopher Wayne Turner, Guy Robert Babbitt, Nicholas Paul Echter, James William Howland
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Patent number: 8622859Abstract: A system for hydraulic hybridization of a motor vehicle according to embodiments of the present invention includes a planetary gear mechanism including a first, second, and third planetary member and planet gears, wherein one of the first, second, and third planetary members is a sun gear, one is a ring gear, and one is a carrier; an engine, the engine including a crank shaft; a transmission, the transmission including a transmission input shaft; and a hydraulic pump/motor, the pump/motor including a pump shaft; and wherein the first planetary member is mechanically coupled to the pump shaft, wherein the second planetary member is mechanically coupled to the crank shaft, wherein the third planetary member is mechanically coupled to the transmission input shaft, and wherein the hydraulic pump/motor is not part of a hydrostatic transmission system.Type: GrantFiled: June 10, 2010Date of Patent: January 7, 2014Assignee: Czero Holding Company, LLCInventors: Guy Robert Babbitt, Christopher Wayne Turner, Nicholas Paul Echter, James William Howland, James Mathew Quinlan
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Publication number: 20120077632Abstract: A system for hydraulic hybridization of a motor vehicle according to embodiments of the present invention includes a planetary gear mechanism including a first, second, and third planetary member and planet gears, wherein one of the first, second, and third planetary members is a sun gear, one is a ring gear, and one is a carrier; an engine, the engine including a crank shaft; a transmission, the transmission including a transmission input shaft; and a hydraulic pump/motor, the pump/motor including a pump shaft; and wherein the first planetary member is mechanically coupled to the pump shaft, wherein the second planetary member is mechanically coupled to the crank shaft, wherein the third planetary member is mechanically coupled to the transmission input shaft, and wherein the hydraulic pump/motor is not part of a hydrostatic transmission system.Type: ApplicationFiled: June 10, 2010Publication date: March 29, 2012Applicant: CZERO HOLDING COMPANY, LLCInventors: Guy Robert Babbitt, Christopher Wayne Turner, Nicholas Paul Echter, James William Howland, James Mathew Quinlan
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Publication number: 20110120070Abstract: A method for harvesting algae according to embodiments of the present invention includes filling a reservoir at least partially with a liquid, submerging a bag at least partially in the liquid, the bag containing media, the media comprising algae, the bag comprising a first end, a second end, a harvesting port located closer to the first end than to the second end, and a gas port, delivering gas into the bag through the gas port, and raising the second end of the bag by accumulating the gas at the second end to flow the media toward the harvesting port.Type: ApplicationFiled: June 23, 2010Publication date: May 26, 2011Inventors: Peter F. HENTGES, Thomas Carroll BARLOW, Jeff Tyler PENOYER, David Scott GORHAM, Jason Charles QUINN, Peter Allen LETVIN, Christopher Wayne TURNER, Guy Robert BABBITT, Nicholas Paul ECHTER, James William HOWLAND
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Publication number: 20060219658Abstract: A method of measuring at least one electrical property of a semiconductor wafer includes providing an elastically deformable and electrically conductive contact having an insulative oxide layer formed on an exterior surface thereof by a controlled oxidation process, such as, without limitation, thermal oxidation, anodic oxidation or deposition oxidation. A first electrical contact is formed between the oxide layer on the surface of the contact and a dielectric layer overlaying a top surface of the semiconductor wafer and a second electrical contact is formed with the semiconductor wafer. A CV type stimulus is applied between the first electrical contact and the second electrical contact. A response of the semiconductor wafer to the CV type stimulus is measured and at least one electrical property of the dielectric layer, the semiconductor wafer or both is determined from the response.Type: ApplicationFiled: April 5, 2005Publication date: October 5, 2006Applicant: Solid State Measurements, Inc.Inventor: William Howland
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Publication number: 20060097740Abstract: A semiconductor wafer is tested by heating an electrical contact to a temperature sufficient to desorb water vapor and/or organic material from a surface thereof. The semiconductor wafer is also heated to a temperature sufficient to desorb water vapor and/or organic material from a top surface thereof. The heated surface of the contact is caused to touch the heated top surface of the semiconductor wafer. An electrical stimulus is applied between the heated surface of the contact and the heated top surface of the semiconductor wafer when the surface of the contact is touching the top surface of the semiconductor wafer. A response of the semiconductor wafer to the applied electrical stimulus is measured and at least one electrical property of the semiconductor wafer is determined from the measured response.Type: ApplicationFiled: November 5, 2004Publication date: May 11, 2006Applicant: Solid State Measurements, Inc.Inventors: William Howland, Brian Bobrzynski
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Publication number: 20060066323Abstract: To determine a concentration of defects and/or impurities in a semiconductor wafer, a first value of current is caused to flow in the semiconductor wafer having a substrate of semiconducting material. The semiconductor wafer is exposed to a pulse of light whereupon electron-hole pairs generated in the semiconductor wafer in response to the light pulse cause the current to increase to a second value. After termination of the light pulse, the rate of change of the current from the second value toward the first value is determined. A concentration of defects and/or impurities in the semiconductor wafer is determined as a function of the rate of change.Type: ApplicationFiled: September 28, 2004Publication date: March 30, 2006Applicant: Solid State Measurements, Inc.Inventors: William Howland, Brian Bobrzynski
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Publication number: 20060068514Abstract: A current-voltage response of at least one site of a semiconductor wafer where ions have been implanted in the semiconducting material of the semiconductor wafer is measured prior to annealing the semiconductor wafer. From the measured response, a determination is made whether the ion implantation is within acceptable tolerance(s).Type: ApplicationFiled: September 30, 2004Publication date: March 30, 2006Applicant: Solid State Measurements, Inc.Inventor: William Howland
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Publication number: 20050287684Abstract: To detect soft breakdown of a dielectric layer of a semiconductor wafer, a DC current is caused to flow between a top surface of the dielectric layer and the semiconducting material of the semiconductor wafer. The DC current is either a constant value DC current, or a DC current that swept and/or stepped from a first value toward a second value in a manner whereupon the electric field and, hence, a DC voltage induced across the dielectric layer increases as the DC current approaches the second value. The response of the semiconductor wafer to the flow of DC current is measured for the presence of an AC voltage component superimposed on the DC voltage. The value of the DC voltage induced across the dielectric layer where the AC voltage component is detected is designated as the soft breakdown voltage of the dielectric layer.Type: ApplicationFiled: June 28, 2004Publication date: December 29, 2005Applicant: Solid State Measurements, Inc.Inventors: William Howland, Robert Hillard
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Publication number: 20050253618Abstract: In a method of measuring at least one electrical property of a semiconductor wafer, an elastically deformable conductive contact formed from an electrically conductive coating overlaying an electrically conductive base material is provided. The base material has a first work function and the coating has a second work function. A first electrical contact is formed between the conductive contact and a top surface of a semiconductor wafer. A second electrical contact is formed with the semiconductor wafer. An electrical stimulus is applied between the first and second electrical contacts and a response of the semiconductor wafer to the electrical stimulus is measured. At least one electrical property of the semiconductor wafer is determined from the response.Type: ApplicationFiled: May 14, 2004Publication date: November 17, 2005Applicants: Solid State Measurements, Inc., Applied Materials, Inc.Inventors: William Howland, Robert Hillard, Steven Hung
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Publication number: 20050241175Abstract: To remove and/or prevent contamination of a probe, at least a portion of the probe is positioned in a chamber having an inlet passage and an outlet passage, with a distal end of the probe extending through the outlet passage and terminating on a side thereof opposite the chamber. A gas is caused to flow through the inlet passage into the chamber and out the outlet passage, thereby modifying an environment surrounding the distal end of the probe. The gas may be heated prior to injection.Type: ApplicationFiled: April 28, 2004Publication date: November 3, 2005Applicant: Solid State Measurements, Inc.Inventors: William Howland, James Healy
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Publication number: 20050146348Abstract: In an apparatus and method for determining a permittivity of a dielectric layer on a semiconductor wafer, a thickness of the dielectric layer is determined and a topside of the wafer is moved into contact with a spherical portion of an at least partially spherical and electrically conductive surface. An electrical stimulus is applied between the electrically conductive surface and the semiconducting material. A capacitance of a capacitor comprised of the electrically conductive surface, the semiconductor material and the dielectric layer is determined from the applied stimulus. A permittivity of the dielectric layer is then determined as a function of the capacitance and the thickness of the dielectric layer.Type: ApplicationFiled: December 30, 2003Publication date: July 7, 2005Inventors: William Howland, Christine Kalnas
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Publication number: 20050028836Abstract: A method of processing a semiconductor wafer includes utilizing a heated gas to heat at least one part of a semiconductor wafer by convection whereupon at least one contaminant is desorbed therefrom. A stream of cooling gas is caused to pass over the one part of the semiconductor wafer in the absence of heated gas to cool the one part of the semiconductor wafer. A metrology tool is then caused to measure at least one part of the semiconductor wafer to determine at least one characteristic thereof.Type: ApplicationFiled: August 8, 2003Publication date: February 10, 2005Inventors: Michael Adams, James Healy, William Howland
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Patent number: 4624295Abstract: A compound lumber slab is formed from several pieces of lumber which are edge-glued together using finger joints. The fingers have the shape in cross section of truncated triangles. These fingers, and their mating grooves, are alternately disposed along the edges of the lumber so that a saw cutting a panel from the slab will cut through the flat top of a truncated triangle, thereby producing glue lines parallel to the panel edges on the resulting panel surfaces. The truncated triangles are shaped and dimensioned to optimize the structural integrity of the resulting panels. The mating fingers and grooves may have a noninterfering fit to produce closed glue lines on the finished panel surfaces.Type: GrantFiled: May 20, 1985Date of Patent: November 25, 1986Assignee: The Nicolai CompanyInventor: William A. Howland