Patents by Inventor William A. Williams

William A. Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
    Patent number: 11960206
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 6, 2022
    Date of Patent: April 16, 2024
    Assignee: ROHM AND HASS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • BELTS WITH INCREASED FLEXIBILITY FOR PERSONAL MOBILITY, AUTOMOTIVE AND INDUSTRIAL APPLICATIONS
    Publication number: 20240003405
    Abstract: Endless belts, such as for use with e-bikes and other personal mobility systems such as standard bicycles, wheelchairs, scooters including electric scooters, and other systems that utilize a belt for transmitting power to impart motion to the system. The belts are particularly suited for inhibiting “tooth jumping” during use. In some embodiments, at least a portion of the teeth of the belt are formed from a different material than the body of the belt, the material of the teeth having a higher modulus than the material of the body. The belts can utilize reinforcing cords, such as carbon cords, which when incorporated into the final belt.
    Type: Application
    Filed: October 4, 2022
    Publication date: January 4, 2024
    Inventors: Thomas S. MOSS, Bobbie E. SOUTH, Maggie SACKSE, William WILLIAMS, Alex WARNEKE
  • PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE
    Publication number: 20230094313
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 6, 2022
    Publication date: March 30, 2023
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
    Patent number: 11550217
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: January 10, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • Method using silicon-containing underlayers
    Patent number: 11506979
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: November 22, 2022
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
  • Photoresists comprising carbamate component
    Patent number: 10539870
    Abstract: New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: January 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: William Williams, III, Cong Liu, Cheng-Bai Xu
  • Photoacid generator
    Patent number: 10509315
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: December 17, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • PHOTOACID GENERATOR
    Publication number: 20190243239
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: April 8, 2019
    Publication date: August 8, 2019
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • Photoacid generator
    Patent number: 10317795
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: June 11, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • METHOD USING SILICON-CONTAINING UNDERLAYERS
    Publication number: 20180164686
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
    Type: Application
    Filed: December 7, 2017
    Publication date: June 14, 2018
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
  • METHOD USING SILICON-CONTAINING UNDERLAYERS
    Publication number: 20180164685
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, are provided.
    Type: Application
    Filed: November 30, 2017
    Publication date: June 14, 2018
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Shintaro Yamada, James F. Cameron, William Williams
  • Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image
    Patent number: 9921475
    Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: March 20, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, Cong Liu
  • PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
    Publication number: 20180059542
    Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Emad Aqad, William Williams, III, Cong Liu
  • SYSTEM AND PROCESS FOR THE MANUFACTURE OF HYDROCARBONS AND UPGRADED COAL BY CATALYTIC MILD TEMPERATURE PYROLYSIS OF COAL
    Publication number: 20170198221
    Abstract: A process for upgrading a solid carbonaceous material includes heating the solid carbonaceous material in the presence of a catalyst under partial pyrolysis conditions and obtaining an upgraded solid carbonaceous product, a gaseous product, and a spent catalyst.
    Type: Application
    Filed: May 22, 2015
    Publication date: July 13, 2017
    Inventors: Matthew TARGETT, Hani Gadalla, William Latta, William Williams, Jens Assmann, Rainer Bellinghausen
  • PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE
    Publication number: 20170192353
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 22, 2016
    Publication date: July 6, 2017
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • PHOTOACID GENERATOR
    Publication number: 20170192352
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 22, 2016
    Publication date: July 6, 2017
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • Graphical conversion between test program languages
    Patent number: 9529704
    Abstract: A parser may be graphically modified without needing to directly alter the parser software and may be graphically modified to adjust for extensibility of the source test program language. The parser may be graphically modify to adjust for extensibility of the destination test program language and to translate a new text based test program language not inherently built into the parser.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: December 27, 2016
    Assignee: AAI Corporation
    Inventors: Michael Waldon, William Williams, Olivia Schultz
  • Purification method
    Patent number: 9440899
    Abstract: A method of separating a secondary alcohol compound from a primary alcohol compound using selective acylation is provided.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: September 13, 2016
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Christopher D. Gilmore, Chi-Wan Lee, Peter Trefonas, III, William Williams, III, Qiuzhe Xie
  • PURIFICATION METHOD
    Publication number: 20160168064
    Abstract: A method of separating a secondary alcohol compound from a primary alcohol compound using selective acylation is provided.
    Type: Application
    Filed: December 15, 2014
    Publication date: June 16, 2016
    Inventors: Christopher D. GILMORE, Chi-Wan LEE, Peter TREFONAS, III, William WILLIAMS, III, Qiuzhen XIE
  • Filter for breathing mask
    Patent number: D968712
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: November 1, 2022
    Assignee: CLEANSPACE IP PTY LTD
    Inventors: Jonah Beard, John Michael Snow, Oliver Henry William Williams, Dan Kao, Alexander Virr, Damian Charles Johnson