Abstract: In the description and drawings a fiberglass product is disclosed. The fiberglass product may have one or more fiber curl layers. The fiber curl layers may have a plurality of generally sinusoidal fiber bundles therein.

Abstract: In the description and drawings a fiberglass product is disclosed. The fiberglass product may have one or more fiber curl layers. The fiber curl layers may have a plurality of generally sinusoidal fiber bundles therein.

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.

Abstract: 2,4-diaminopyrimidine compounds of generic Formula 1, where R and R? may be the same or different and are independently selected from: C1-C6 alkyl or alkenyl groups with 1, 2, 3, 4, 5 or 6 carbon atoms, which may be: branched or unbranched; saturated or unsaturated; and may or may not be substituted, are used to treat anthrax.

Abstract: Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.

Abstract: A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O.), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO2) or nitrous oxide (N2O) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O2).

Abstract: A composition which provides enhanced removal of aldehydes from the air of the building interior. The composition includes an amino silane and a multivalent metal carbonate and is especially suitable for adding to building product board substrates, such as acoustical ceiling panels and gypsum wallboards. The composition of the invention can be applied during manufacturing or can be post applied to already constructed room surfaces. The composition provides longevity of aldehyde removal heretofore unachieved.

Abstract: A method of treating an anthrax infection wherein a compound of formula I wherein R1 and R2 represent, independently of one another unsubstituted or specifically substituted C1-4alkoxy; and R3 represents hydrogen; cyano; unsubstituted or specifically substituted C1-6alkyl; C3-6cycloalkyl; C2-6alkenyl; C7-18bicyclyl; aryl, aryl-C1-4alkyl, aryl-Q-C1-4alkyl heteroaryl, heterocyclyl or heterocyclyl-C1-6alkyl, wherein aryl denotes a mono- or poly-nucleous group with 6 to 14 ring carbon atoms; heterocyclyl denotes a 4- to 6-membered non-aromatic heterocyclic group comprising 1 to 3, nitrogen, oxygen and/or sulfur atoms; heteroaryl denotes a mono- or polynuclear heteroaromatic group consisting 5- and/or 6-membered rings and comprising 5 to 13 carbon atoms and 1 to 4, nitrogen, oxygen and/or sulfur atoms; and Q means —SO— or —SO2—; or a pharmaceutically acceptable salt, solvate or hydrate or a prodrug thereof; is administered to said subject in a quantity effective to inhibit, suppress, or expel an anthrax inf

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.

Abstract: A radical-enhanced atomic layer deposition (REALD) system and method involves moving a substrate along a circulating or reciprocating transport path between zones that provide alternating exposure to a precursor gas and a gaseous radical species. The radical species may be generated in-situ within a reaction chamber by an excitation source such as plasma generator or ultraviolet radiation (UV), for example. The gaseous radical species is maintained in a radicals zone within the reaction chamber while a precursor gas is introduced into a precursor zone. The precursor zone is spaced apart from the radicals zone to define a radical deactivation zone therebetween. Purge gas flowing through the various zones may provide flow and pressure conditions that substantially prevent the precursor gas from flowing into the radicals zone. In some embodiments, the system includes a partition having one or more flow-restricting passageways though which the substrate is transported.

Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.

Abstract: The invention is a surface coating which will reduce the aldehyde concentration in a room via a aldehyde reactive material contained in the coating. Upon reaction, the aldehyde becomes part of the reactive molecule and, thus, is permanently held within the coating.

Abstract: Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.

Abstract: A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O•), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO2) or nitrous oxide (N2O) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O2).

Abstract: The present invention relates to a system and method for the system and method for modeling demand by consumer segments. In some embodiments a segment data organizer may receive transaction data. Transaction data may include transaction logs (T logs) from point of sales records from a retailer. These transaction logs, for the most part, include identification information for each transaction. The segment data organizer may also receive customer identification data which includes groupings of customers by consumer segments. The identification information within the transaction logs may be cross referenced by the customer identification data in order to generate groupings of transactions belonging to consumers in each segment. The organizer may then also aggregate the transaction logs by location, time series and product. The aggregated data may be supplied to an econometric engine capable of generating elasticity coefficients for each set of aggregate data.

Abstract: Methods of constructing composite films including particles embedded in a filler matrix involve preparing a collection of stacked particles, then depositing a matrix material throughout the particle collection using an atomic layer deposition (ALD) method so as to substantially completely fill the spaces between the particles with the matrix material. During matrix deposition, a vapor phase etch cycle may be periodically employed to avoid clogging of small pores in the particle collection. New composite materials formed by such methods are also disclosed.

Abstract: A method of treating an anthrax infection wherein a compound of formula I wherein R1 and R2 represent, independently of one another unsubstituted or specifically substituted C1-4alkoxy; and R3 represents hydrogen; cyano; unsubstituted or specifically substituted C1-6alkyl; C3-6cycloalkyl; C2-6alkenyl; C7-18bicyclyl; aryl, aryl-C1-4alkyl, aryl-Q-C1-4alkyl heteroaryl, heterocyclyl or heterocyclyl-C1-6alkyl, wherein aryl denotes a mono- or poly-nucleous group with 6 to 14 ring carbon atoms; heterocyclyl denotes a 4- to 6-membered non-aromatic heterocyclic group comprising 1 to 3, nitrogen, oxygen and/or sulfur atoms; heteroaryl denotes a mono- or polynuclear heteroaromatic group consisting 5- and/or 6-membered rings and comprising 5 to 13 carbon atoms and 1 to 4, nitrogen, oxygen and/or sulfur atoms; and Q means —SO— or —SO2—; or a pharmaceutically acceptable salt, solvate or hydrate or a prodrug thereof; is administered to said subject in a quantity effective to inhibit, suppress, or expel an anthrax inf