Patents by Inventor William Barrows

William Barrows has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210275958
    Abstract: In the description and drawings a fiberglass product is disclosed. The fiberglass product may have one or more fiber curl layers. The fiber curl layers may have a plurality of generally sinusoidal fiber bundles therein.
    Type: Application
    Filed: February 26, 2021
    Publication date: September 9, 2021
    Inventors: Alejandro Vinardi, Matthew Shaffer, William Barrows
  • Patent number: 9469901
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.
    Type: Grant
    Filed: May 8, 2012
    Date of Patent: October 18, 2016
    Assignee: LOTUS APPLIED TECHONOLOGY, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 9238868
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: January 19, 2016
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20150065509
    Abstract: 2,4-diaminopyrimidine compounds of generic Formula 1, where R and R? may be the same or different and are independently selected from: C1-C6 alkyl or alkenyl groups with 1, 2, 3, 4, 5 or 6 carbon atoms, which may be: branched or unbranched; saturated or unsaturated; and may or may not be substituted, are used to treat anthrax.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 5, 2015
    Inventors: William Barrow, Christina Renee Bourne, Richard Alan Bunce, Kenneth D. Berlin, Baskar Nammalwar, Kalyanaraman Ramnarayan
  • Patent number: 8637117
    Abstract: Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: January 28, 2014
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8637123
    Abstract: A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O.), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO2) or nitrous oxide (N2O) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O2).
    Type: Grant
    Filed: December 28, 2010
    Date of Patent: January 28, 2014
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8598069
    Abstract: A composition which provides enhanced removal of aldehydes from the air of the building interior. The composition includes an amino silane and a multivalent metal carbonate and is especially suitable for adding to building product board substrates, such as acoustical ceiling panels and gypsum wallboards. The composition of the invention can be applied during manufacturing or can be post applied to already constructed room surfaces. The composition provides longevity of aldehyde removal heretofore unachieved.
    Type: Grant
    Filed: July 20, 2009
    Date of Patent: December 3, 2013
    Assignee: AWI Licensing Company
    Inventors: William Barrows, Gourish Sirdeshpande, Kenneth G. Caldwell, John R. Garrick, Michael Cook
  • Patent number: 8268825
    Abstract: A method of treating an anthrax infection wherein a compound of formula I wherein R1 and R2 represent, independently of one another unsubstituted or specifically substituted C1-4alkoxy; and R3 represents hydrogen; cyano; unsubstituted or specifically substituted C1-6alkyl; C3-6cycloalkyl; C2-6alkenyl; C7-18bicyclyl; aryl, aryl-C1-4alkyl, aryl-Q-C1-4alkyl heteroaryl, heterocyclyl or heterocyclyl-C1-6alkyl, wherein aryl denotes a mono- or poly-nucleous group with 6 to 14 ring carbon atoms; heterocyclyl denotes a 4- to 6-membered non-aromatic heterocyclic group comprising 1 to 3, nitrogen, oxygen and/or sulfur atoms; heteroaryl denotes a mono- or polynuclear heteroaromatic group consisting 5- and/or 6-membered rings and comprising 5 to 13 carbon atoms and 1 to 4, nitrogen, oxygen and/or sulfur atoms; and Q means —SO— or —SO2—; or a pharmaceutically acceptable salt, solvate or hydrate or a prodrug thereof; is administered to said subject in a quantity effective to inhibit, suppress, or expel an anthrax inf
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: September 18, 2012
    Assignee: The Board of Regents for Oklahoma State University
    Inventors: Jurg Dreier, William Barrow, Esther Barrow
  • Publication number: 20120219708
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.
    Type: Application
    Filed: May 8, 2012
    Publication date: August 30, 2012
    Applicant: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20120171371
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.
    Type: Application
    Filed: March 9, 2012
    Publication date: July 5, 2012
    Applicant: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8202366
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: June 19, 2012
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8187679
    Abstract: A radical-enhanced atomic layer deposition (REALD) system and method involves moving a substrate along a circulating or reciprocating transport path between zones that provide alternating exposure to a precursor gas and a gaseous radical species. The radical species may be generated in-situ within a reaction chamber by an excitation source such as plasma generator or ultraviolet radiation (UV), for example. The gaseous radical species is maintained in a radicals zone within the reaction chamber while a precursor gas is introduced into a precursor zone. The precursor zone is spaced apart from the radicals zone to define a radical deactivation zone therebetween. Purge gas flowing through the various zones may provide flow and pressure conditions that substantially prevent the precursor gas from flowing into the radicals zone. In some embodiments, the system includes a partition having one or more flow-restricting passageways though which the substrate is transported.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: May 29, 2012
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8137464
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: March 20, 2012
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8119560
    Abstract: The invention is a surface coating which will reduce the aldehyde concentration in a room via a aldehyde reactive material contained in the coating. Upon reaction, the aldehyde becomes part of the reactive molecule and, thus, is permanently held within the coating.
    Type: Grant
    Filed: July 20, 2009
    Date of Patent: February 21, 2012
    Assignee: AWI Licensing Company
    Inventors: Kenneth G. Caldwell, Gourish Sirdeshpande, William Barrows, John R. Garrick, Michael Cook
  • Publication number: 20110256323
    Abstract: Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.
    Type: Application
    Filed: October 14, 2010
    Publication date: October 20, 2011
    Applicant: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20110159204
    Abstract: A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O•), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO2) or nitrous oxide (N2O) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O2).
    Type: Application
    Filed: December 28, 2010
    Publication date: June 30, 2011
    Applicant: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20110131079
    Abstract: The present invention relates to a system and method for the system and method for modeling demand by consumer segments. In some embodiments a segment data organizer may receive transaction data. Transaction data may include transaction logs (T logs) from point of sales records from a retailer. These transaction logs, for the most part, include identification information for each transaction. The segment data organizer may also receive customer identification data which includes groupings of customers by consumer segments. The identification information within the transaction logs may be cross referenced by the customer identification data in order to generate groupings of transactions belonging to consumers in each segment. The organizer may then also aggregate the transaction logs by location, time series and product. The aggregated data may be supplied to an econometric engine capable of generating elasticity coefficients for each set of aggregate data.
    Type: Application
    Filed: October 31, 2010
    Publication date: June 2, 2011
    Inventors: Suzanne Valentine, Siddharth Patil, Paul Algren, William Barrows Peale, Robert Parkin, Joshua Kneubuhl, Sean McCauley
  • Patent number: 7923068
    Abstract: Methods of constructing composite films including particles embedded in a filler matrix involve preparing a collection of stacked particles, then depositing a matrix material throughout the particle collection using an atomic layer deposition (ALD) method so as to substantially completely fill the spaces between the particles with the matrix material. During matrix deposition, a vapor phase etch cycle may be periodically employed to avoid clogging of small pores in the particle collection. New composite materials formed by such methods are also disclosed.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: April 12, 2011
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20100305119
    Abstract: A method of treating an anthrax infection wherein a compound of formula I wherein R1 and R2 represent, independently of one another unsubstituted or specifically substituted C1-4alkoxy; and R3 represents hydrogen; cyano; unsubstituted or specifically substituted C1-6alkyl; C3-6cycloalkyl; C2-6alkenyl; C7-18bicyclyl; aryl, aryl-C1-4alkyl, aryl-Q-C1-4alkyl heteroaryl, heterocyclyl or heterocyclyl-C1-6alkyl, wherein aryl denotes a mono- or poly-nucleous group with 6 to 14 ring carbon atoms; heterocyclyl denotes a 4- to 6-membered non-aromatic heterocyclic group comprising 1 to 3, nitrogen, oxygen and/or sulfur atoms; heteroaryl denotes a mono- or polynuclear heteroaromatic group consisting 5- and/or 6-membered rings and comprising 5 to 13 carbon atoms and 1 to 4, nitrogen, oxygen and/or sulfur atoms; and Q means —SO— or —SO2—; or a pharmaceutically acceptable salt, solvate or hydrate or a prodrug thereof; is administered to said subject in a quantity effective to inhibit, suppress, or expel an anthrax inf
    Type: Application
    Filed: September 25, 2006
    Publication date: December 2, 2010
    Inventors: Jurg Dreier, William Barrow, Esther Barrow
  • Publication number: 20100214526
    Abstract: A tool for use in affixing an optical component, such as glass, to a liquid crystal display (LCD) using a silicone gel mixture of dimethyl siloxane and a vinyl terminated dimethyl polymer includes, in one embodiment, a unitary metallic platen that is shaped to define a central window. A narrow shelf is defined around the outer periphery of the central window, the shelf serving to support the optical component during the application of the silicone gel thereon. A upwardly extending partition is formed onto the top surface of the platen around the shelf, the partition serving, among other things, to retain the optical component fixed in place on the platen during the assembly process. A plurality of identical, spaced apart, upwardly extending standoffs are formed onto the free end of the partition and are designed to support the LCD a fixed distance away from the optical component.
    Type: Application
    Filed: November 24, 2009
    Publication date: August 26, 2010
    Applicant: VIA OPTRONICS, LLC
    Inventors: William A. Barrow, Maria E. Crouser, Wayne Patrick Gentry, Andrew Mitchell Robinson