Patents by Inventor William Brunsvold

William Brunsvold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Underlayer compositions for multilayer lithographic processes
    Publication number: 20050019704
    Abstract: Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
    Type: Application
    Filed: August 18, 2004
    Publication date: January 27, 2005
    Inventors: Mahmoud Khojasteh, Timothy Hughes, Ranee Kwong, Pushkara Varanasi, William Brunsvold, Margaret Lawson, Robert Allen, David Medeiros, Ratnam Sooriyakumaran, Phillip Brock